Balzers Aktiengesellschaft

Unaxis-balzers Aktiengesellschaft

Balzers Hochvakuum Ag

Johann Karner

Erich Bergmann

Mauro Pedrazzini

David Franz

Ingrid Reineck

Helmut Daxinger

Mats E Sjostrand

Christoph Hollenstein

Wolfgang Schoeb

The present invention relates to a method for diamond coating of substrates in which the substrate is exposed in a vacuum atmosphere to a reactive gas mixture excited by means of a plasma discharge, the plasma discharge comprising a plasma beam () in an evacuated receiver () that is formed between a cathode chamber () and an anode (), and the reactive gas mixture comprising a reactive gas and a working gas, the reactive gas in () and the working gas in () and/or () introduced into the receiver, and the receiver () is evacuated by a pump arrangement (), and the hydrogen concentration of the reactive gas mixture being 0&#x2013;45 vol. %.

Method for diamond coating substrates

Vacuum treatment installation with a vacuum treatment chamber containing a plasma discharge configuration as well as a gas supply configuration. The plasma discharge configuration has at least two plasma beam discharge configurations with substantially parallel discharge axes and a deposition configuration is positioned along a surface which extends at predetermined distances from the beam axes and along a substantial section of the longitudinal extent of the discharge beam.

Installation and method for vacuum treatment or powder production

Method for coating workpieces generates a beam of a plasma in an evacuated container. A region of highest plasma density is at the beam axis and workpieces having surfaces to be coated, are radially offset from, and extend along the axis with the surfaces facing the axis and being in the container. Fresh reactive gas is inlet into the container and consumed gas is removed from the container. Coating material is deposited upon the surfaces with a deposition rate of at least 400 nm/min and at a maximum temperature of the surfaces being 550&deg; C.

Coating workpiece method using beam of plasma

A method for coating a sintered metal carbide substrate with a diamond film is disclosed, which comprises subjecting the substrate to a selective tungsten carbide etching step; subjecting the substrate to a selective Co etching step; and subsequently coating a desired section of the substrate with the diamond film, and where after completion of the selective tungsten carbide etching step and prior to diamond coating the substrate is nucleated with diamond powder through friction contact.

Process for coating sintered metal carbide substrates with a diamond film

A process provides for the reactive treatment of workpieces in which a plasma beam is produced in an evacuated recipient. With respect to the area of the highest plasma density along the beam axis, workpieces are arranged in a radially offset manner. Fresh reactive gas is charged into the recipient and used-up gas is sucked out of the recipient. A vacuum treatment system comprises a plasma beam production arrangement, a gas inlet operatively connected with a reactive gas supply, an axially extending workpiece carrier arrangement radially set off from an axis of a plasma beam produced by the plasma beam production arrangement. The workpiece carrier arrangement mounts a rotational surface coaxial with respect to the axis of the plasma beam and a gas suction system. The process and system are used to deposit metastable layers, including cBN-layers, .alpha.-Al.sub.2 O.sub.3 layers, C.sub.3 N.sub.4 layers, and diamond layers, on the workpieces, to surface treat with reactive chemical compounds, including free radicals, and to coat.

Vacuum treatment system for homogeneous workpiece processing

Coated body, method for its manufacturing as well as its use

The invention relates to a method for depositing a diamond coating on a workpiece, for instance a drawing die or a tool punch, whereby a reactive plasma supported coating method is used. According to the invention the generation of the plasma is made by a direct current discharge, whereby additionally a flow of charged particles is fed into the discharge gap; according to the invention the workpiece to be coated is positioned in the discharge gap. Due to the inventive design a relatively long discharge gap can be used, such that also large surface areas can be coated; the coating is made at a location of the highest homogeneity and density of the plasma. By means of the invention a method is provided which can be controlled regarding financial expenses and in a reliable manner and which is suitable for large surface area coating.

Plasma CVD method for producing a diamond coating

A method and apparatus for a reactive treatment of the surface of a workpiece, in which a process gas is brought into a chamber and a direct voltage arc discharge is generated in the chamber, the arc discharge is assisted or maintained, respectively by a coupling in of a flow of charged particles. In known treatment methods plasma generated in the direct voltage arc are generally distributed inhomogeneously in the inner space of the chamber and the area with a density of the plasma which is sufficient for the reactive surface treatment is relatively small. According to the invention this problem is solved in that the distribution of the effect of the treatment of the plasma in the chamber at least along a predetermined plane is set, and specifically by a setting of an areal distribution of the process gas inlet and/or setting of an areal distribution of the arc discharges in the chamber, in that the flow of charged particles is coupled into the chamber via a plurality of distribution openings. By such means, spatially large plasmas having high densities of ionization and acceptable densities of energy can be realized, such that it is possible to perform on the one hand treatment of large surface areas and on the other hand also treatment processes on objects which are thermally sensitive.

Method of and apparatus for a direct voltage arc discharge enhanced

An apparatus for a reactive treatment of the surface of a workpiece, in which a process gas is brought into a chamber and a direct voltage arc discharge is generated in the chamber, the arc discharge is assisted or maintained, respectively by introducing a flow of charged particles. In known treatment methods, plasma generated in the direct voltage arc are generally distributed non-homogeneously in the inner space of the chamber and the area with a density of the plasma which is sufficient for the reactive surface treatment is relatively small. According to the invention this problem is solved in that the distribution of the effect of the treatment of the plasma in the chamber at least along a predetermined plane is set, and specifically by a distribution of openings for the process gas over a given area and/or by a distribution of the arc discharges in the chamber over a given area. The flow of charged particles enters into the chamber via a plurality of distribution openings. By such an arrangement, spatially large plasmas having high densities of ionization and acceptable densities of energy are realized, and it is possible to perform treatment of large surface areas and also treatment processes on objects which are thermally sensitive.

Growing community of inventors

Feldkirch, Austria

Johann Karner