Mapper Lithography IP B.v.

Asml Netherlands B.v.

Other

Johan Joost Koning

Stijn Willem Herman Karel Steenbrink

Alexander Hendrik Vincent Van Veen

Remco Jager

Willem Henk Urbanus

Marc Smits

Chris Franciscus Jessica Lodewijk

Bart Schipper

Christiaan Otten

Hindrik Willem Mook

Ludovic Lattard

Johannes Petrus Sprengers

Stijn Willem Herman Steenbrink

Peter Veltman

David Johannes Van Den Bergen

Norman Hendrikus Rudolf Baars

Alon Rosenthal

Sohail Chatoor

Joost Witteveen

A charged particle beam system is disclosed, comprising: Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

Method and system for the removal and/or avoidance of contamination in charged particle beam systems

A charged particle beam system is disclosed, comprising: wherein the charged particle optical element comprises: wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

The invention relates to a target processing unit () comprising a vacuum chamber () for accommodating a target to be processed, a projection column () within the vacuum chamber for generating a beam and projecting the beam towards the target, and a first conduit arrangement () for connecting the projection column to external equipment (). The vacuum chamber can comprise a positioning system () for supporting the target, and a second conduit arrangement () distinct from the first conduit arrangement for connecting the positioning system to external equipment, wherein the positioning system is moveably arranged with respect to the projection column, and wherein the positioning system and the projection column occupy spatially distinct portions of the vacuum chamber. The first conduit arrangement extends through an upper side of the vacuum chamber, and the second conduit arrangement extends through a lower side of the vacuum chamber.

Target processing unit

An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.

Electrostatic lens structure

The invention relates to a projection lens assembly for directing a beam toward a target. This assembly includes a lens support body () that spans a plane (P), and has a connection region () and a lateral edge (). The lens support body is arranged for insertion into a frame () of a processing unit along an insertion direction (X) parallel with the plane (P). The projection lens assembly includes conduits (-) emanating from the connection region, and a conduit guiding body (-) for accommodating the conduits. The guiding body includes a first guiding portion () for guiding the conduits from the connection region, along the plane to a lateral region (B) beyond the lateral edge. The guiding body also includes a second guiding portion () for guiding the conduits from the lateral region (B) toward a tilted edge () of the conduit guiding body.

The invention relates to a charged particle optical device for manipulating a trajectory of multiple beamlets of charged particles. Said charged particle optical device comprising an electromagnetic deflector comprising a planar substrate having an upper side and a lower side of said substrate, and an even thickness. The substrate comprises:

Charged particle optical device

The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

Enhanced integrity projection lens assembly

The invention relates to a high voltage shielding arrangement comprising a first metal part and a second metal part positioned in close vicinity to said first metal part. Said second metal part included in said arrangement to be set at an electrical potential that is lower than the electric potential of the first metal part. Said second metal part having comprising one or more edges and an insulator. The second metal part is at least partially encapsulated by the insulator facing the first metal part.

Growing community of inventors

Hillegom, Netherlands

Johan Joost Koning