Koninklijke Philips Corporation N.v.

Asml Netherlands B.v.

Nxp B.v.

Ipdia

Taiwan Semiconductor Manufacturing Comp. Ltd.

U.S. Philips Corporation

Signify Holding B.v.

Philips Lighting Holding B.v.

Murata Integrated Passive Solutions

Invensas LLC

Johan Hendrik Klootwijk

Freddy Roozeboom

Adrianus Johannes Maria Giesbers

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Pieter-Jan Van Zwol

Arnoud Willem Notenboom

Mária Péter

David Ferdinand Vles

Maxim Aleksandrovich Nasalevich

Marcel Mulder

Evgenia Kurganova

Derk Reefman

Peter Dirksen

Paul Janssen

Johannes Petrus Martinus Bernardus Vermeulen

Koray Karakaya

Nico Maris Adriaan De Wild

Willem Joan Van Der Zande

Willem-Pieter Voorthuijzen

Ruediger Mauczok

Antonius Franciscus Johannes De Groot

Jan Willem Slotboom

Jaap Ruigrok

Willem Frederik Adrianus Besling

Willem Franke Pasveer

Jacobus Bernardus Giesbers

Vadim Yevgenyevich Banine

Marcus Adrianus Van De Kerkhof

Sander Frederik Wuister

Ronald Dekker

Herfried Karl Wieczorek

Johan Frederik Dijksman

Andre Bernardus Jeunink

Jozef Thomas Martinus Van Beek

Martinus Bernardus Van Der Mark

Roelof Koole

Antonia Cornelia Van Rens

Lukas Frederik Tiemeijer

Hendrik Johannes Bergveld

Vincent Adrianus Henneken

Lucas Johannes Anna Maria Beckers

Alwin Rogier Martijn Verschueren

Abraham Rudolf Balkenende

Frank Verbakel

Johan Marra

Johannes Christiaan Leonardus Franken

Elise Claude Valentine Talgorn

Johannes Weda

Aleksandar Nikolov Zdravkov

Ties Wouter Van Der Woord

Bout Marcelis

Peter Simon Antonius Knapen

Hendrikus Jan Wondergem

Hrishikesh Patel

Gerrit Van Den Bosch

Chaitanya Krishna Ande

Jinesh Balakrishna Pillai Kochupurackal

Marleen Mescher

Johannes Joseph Janssen

Marcel Peter Meijer

Wouter Rogier Meijerink

Raymond Olsman

Leonid Aizikovitsj Sjmaenok

Doede Terpstra

Rogier Adrianus Henrica Niessen

Hendrik Gezienus Albert Huizing

Manuel Eduardo Alarcon-Rivero

Elisabeth M L Moonen

Robert Adrianus Maria Wolters

Antonius L A M Kemmeren

Eyup Aksen

Christianus Martinus Van Heesch

Dennis De Graaf

Cornelis Eustatius Timmering

Antonius Johannes Maria Nellissen

Kamal Asadi

Erik Achilles Abegg

Eric Cornelis Egbertus Van Grunsven

Alexey Sergeevich Kuznetsov

Yukiko Furukawa

Arnoldus Den Dekker

Pascal De Graaf

Tamara Mathea Elisabeth Nijsen

Lionel Guiraud

Alexander Ludwig Klein

Antonius Lucien Adrianus Maria Kemmeren

Johannes Frederik Dijkhuis

Hugo Hubertus Knobel

Mahdiar Valefi

Sander Baltussen

David D R Chevrie

Cornelius Antonius Van Den Heuvel

Jan Hendrik Willem Kuntzel

Rogier A H Niessen

Nicolas Jonathan Pulsford

Frank Pasveer

Francois Lecornec

Maxime Biron

Cornelius Antonius Van Den Huevel

Marcel Bulder

A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.

Pellicle membrane

Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.

Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle

A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Pellicle and pellicle assembly

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

Method of manufacturing a membrane assembly

A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.

Metal-silicide-nitridation for stress reduction

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.

Method for manufacturing a membrane assembly

The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

A 3D gas chromatography (GC) column development is possible by assembly of two parts each being substrates formed by gas tight materials. One part may be a silicon substrate with a snake shaped flow channel structure and the other part may be a glass plate. Both are coated with a column packing comprising polubutadiene, which is also able to glue or bond both parts together, thereby sealing the flow channel, thus forming a GC column. The column packaging can be composed in all kinds of polarity from very hydrophobic till very hydrophilic. In this way the column packing can be tuned on resolution for particular molecules which are interesting to detect, e.g. Octane. The invention is advantageous for micro GC columns.

Gas chromatography column with polybutadiene coating

A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

The invention provides a method for printing a 3D printed object (), the 3D printed object () comprising a first type of printed material () having electrically conductive properties and a second type of printed material () having electrically insulating properties, wherein the method comprises: (I) providing printable material (), wherein the printable material () has electrically insulating properties and wherein the printable material () is convertible by heat to a material () having electrically conductive properties; (II) printing with a 3D printer () said printable material () to generate printed material (); and (III) subjecting to heat part of the printed material () after deposition; to provide said 3D printed object ().

3D printing of graphene (oxide) composites

Disclosed is a method of manufacturing a partially freestanding two-dimensional crystal film ('), the method comprising providing a substrate () carrying a catalyst layer () for forming the two-dimensional crystal layer on a first surface; forming the two-dimensional crystal film on the catalyst layer; covering at least the two-dimensional crystal film with a protective layer (); etching a cavity () in a second surface of the substrate, the second surface being opposite to the first surface, said cavity terminating on the catalyst layer; etching the exposed part of the catalyst layer from the cavity; and removing the protective layer, thereby obtaining a two-dimensional crystal film that is freestanding over said cavity. A device manufactured in this manner is also disclosed.

Method of manufacturing partially freestanding two-dimensional crystal film and device comprising such a film

Growing community of inventors

Eindhoven, Netherlands

Johan Hendrik Klootwijk