Asml Netherlands B.v.

Asml Holding N.v.

Johan Gertrudis Cornelis Kunnen

Thibault Simon Mathieu Laurent

Ruud Hendrikus Martinus Johannes Bloks

Sander Catharina Reinier Derks

Johannes Henricus Wilhelmus Jacobs

Martijn Houben

Marinus Jan Remie

Robbert Jan Voogd

Bastiaan Andreas Wilhelmus Hubertus Knarren

Gerardus Adrianus Antonius Maria Kusters

Gregory Martin Mason Corcoran

Hendrikus Johannes Marinus Van Abeelen

Armand Rosa Jozef Dassen

Nicolaas Ten Kate

Joost Jeroen Ottens

Giovanni Francisco Nino

Raymond Wilhelmus Louis Lafarre

Koen Steffens

Takeshi Kaneko

Ramin Badie

Ronald Van Der Ham

Frederik Eduard De Jong

Laurentius Johannes Adrianus Van Bokhoven

Marcio Alexandre Cano Miranda

Ivo Adam Johannes Thomas

Gerben Pieterse

Hrishikesh Patel

Chung-Hsun Li

Pieter Lein Joseph Gunter

Georgios Tsirogiannis

Patricius Jacobus Neefs

Coen Cornelis Wilhelmus Verspaget

Peng Feng

Hendrik Cornelis Anton Borger

Rogier Hendrikus Magdalena Cortie

Adrianus Hendrik Koevoets

Maxim Pisarenco

Jim Vincent Overkamp

Günes Nakiboglu

Christianus Wilhelmus Johannes Berendsen

Willem Richard Pongers

Johan Franciscus Maria Beckers

Dylan John David Davies

Putra Saputra

Juan Manuel Gonzalez Huesca

Ruud Hendricus Martinus Johannes Bloks

Michael Johannes Hendrika Wilhelmina Renders

Arnaud Hubaux

Ajinkya Ravindra Daware

Andriy Hlod

Sjoerd Nicolaas Lambertus Donders

Frank Johannes Jacobus Van Boxtel

Christopher Charles Ward

Siebe Landheer

Marc Léon Van Der Gaag

Si-Han Zeng

A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

Lithographic apparatus and method

A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

Method for decision making in a semiconductor manufacturing process

A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.

Method and system for determining overlay

A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

Lithographic apparatus and a device manufacturing method

A lithographic apparatuscomprisingincludesan object tablewhich carries an object. The lithographic apparatus may furthercomprise at least oneinclude asensoras part of a measurement systemto measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimatetheadeformation oftheanobject due toavaryingloadsloadduring operation of the lithographic apparatus, for exampleavaryingloadsloadinduced by a two-phase flow in a channel formedwithinofthe object table.Additionally, or alternatively, theThelithographic apparatuscomprisesmay includea predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used toprovide apatterna substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

Lithographic apparatus and an object positioning system

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20&#xb0; C. in at least one direction.

Temperature sensing probe, burl plate, lithographic apparatus and method

An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

Patterning device cooling apparatus

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Growing community of inventors

Weert, Netherlands

Johan Gertrudis Cornelis Kunnen