Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Medimetrics Personalized Drug Delivery B.v.

Medimetrics Personalized Drug Delivery, Inc.

Stoco 10 Gmbh

Tpo Displays Corporation

Progenity, Inc.

Biocartis S.a.

Johan Frederik Dijksman

Sander Frederik Wuister

Yvonne Wendela Kruijt-Stegeman

Ivar Schram

Anke Pierik

Jeff Shimizu

Hans Zou

Jeroen Herman Lammers

Andre Bernardus Jeunink

Aleksey Yurievich Kolesnychenko

Roelof Koole

Michael Jozef Mathijs Renkens

Gerard Van Schothorst

Catharinus De Schiffart

Vadim Yevgenyevich Banine

Klaus Simon

Karel Diederick Van Der Mast

Toon Hardeman

Frits Tobi De Jongh

Krassimir Todorov Krastev

Norbert Erwin Therenzo Jansen

George Arie Jan De Fockert

Gregor Edward Van Baars

Judith Margreet Rensen

Martin Maurice Vernhout

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Wilhelmus Henricus Theodorus Maria Aangenent

Michel Gerardus Pardoel

Koen Gerhardus Winkels

Raymond Jacobus Knaapen

Raymond Jacobus Wilhelmus Knaapen

Raymond Wilhelmus Louis Lafarre

Lucian Remus Albu

Georgiy Olegovich Vaschenko

Dzmitry Labetski

Antonius Theodorus Wilhelmus Kempen

Ramin Badie

Ronald Johannes Hultermans

Theodorus Wilhelmus Driessen

Richard Joseph Marinus Schroeders

Erik Roelof Loopstra

Arie Jeffrey Den Boef

Martinus Bernardus Van Der Mark

Emiel Peeters

Hendrikus Gijsbertus Schimmel

Christianus Martinus Van Heesch

Antonius Johannes Joseph Wismans

Remus Albu

Helmar Van Santen

Johan Hendrik Klootwijk

Andrei Mikhailovich Yakunin

Adrianus Hendrik Koevoets

Hans Marc Bert Boeve

Hendrikus Robertus Marie Van Greevenbroek

Willem-Jan Arend De Wijs

Peter Michael Baumgart

Jacobus Bernardus Giesbers

Ruediger Mauczok

Carolus Johannes Catharina Schoormans

Leendert Van Der Tempel

Wilhelmus Sebastianus Marcus Maria Ketelaars

Wilbert Jan Mestrom

Marinus Josephus Jakobus Dona

Ventzeslav Petrov Iordanov

Jan Okke Nieuwenkamp

Wim Ronald Kampinga

Emiel Andreas Godefridus Peeters

Petrus Leonardus Adrianus Van Der Made

Johan Gerard Kleibeuker

Claude Jean-Marie Malaurie

Yvan O J G Droinet

Peter Wilhelm Hendrik Van Putten

Steven Ferdinand Kleijer

Judith Margaret Rensen

Jari Ruotsalainen

Olaf Weiner

Antonius Johannes Jo Wismans

Adrianus Theodorus Anthonius Maria Raaijmakers

Leonardus Johannes Cornelius Van Den Besselaar

Michel G Pardoel

Cornelis Mutsaers

Antonius Kempen

Lucian R Albu

Antonius J J Wismans

Leonardus J C Van Den Besselaar

Adrianus T A M Raaijmakers

Petrus L A Van Der Made

Johan G Kleibeuker

Olaf H Weiner

An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Imprint lithography

A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.

Supply system for an extreme ultraviolet light source

An EUV source for generating a beam of EUV radiation, has a droplet generator with a nozzle assembly to emit droplets of fuel from a nozzle towards a plasma formation location. The nozzle assembly receives the fuel from a reservoir. The nozzle assembly has a pump chamber receiving the fuel from the reservoir and an actuator to vibrate a membrane that forms a wall of the pump chamber. The wall is oriented perpendicularly to a direction wherein the nozzle emits the fuel. The nozzle assembly has first and second nozzle filters non-adjacently arranged in series in a path of the fuel from the pump chamber to the nozzle.

Droplet generator for lithographic apparatus, EUV source and lithographic apparatus

An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.

Imprint lithography apparatus and method

An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.

Methods for providing patterned orientation templates for self-assemblable polymers for use in device lithography

Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.

A method of aligning a template and a substrate for imprint lithography involves using a mask pattern of the template and a luminescent marker pattern of the substrate, the method including aligning the template mask pattern and the substrate marker pattern using a radiation intensity measurement of radiation emitted by the luminescent marker pattern and having passed the template mask pattern. The mask pattern and the luminescent marker pattern may each be shaped to provide a turning point in the intensity of detected radiation emitted from the marker pattern, and passing through the mask pattern to a detector, as a function of relative displacement at the aligned position. The displacement of the template and substrate may be aligned by identifying the turning point in radiation intensity. The marker pattern may be fluorescent with the emitted radiation excited by a radiation source.

Imprint lithography alignment method and apparatus

A drug delivery device () is provided comprising a drug reservoir () and a piston (). The drug reservoir () is provided for comprising a drug and comprises a flexible wall () and a dispensing hole () for dispensing the drug into an environment of the drug de delivery device (). The piston () is provide for pressing against the flexible wall () to compress the drug reservoir () for pushing an amount of the drug through the dispensing hole (). An adhesion interface () between a surface of the piston () and the flexible wall () prevents sliding between the surface of the piston () and the flexible wall ().

Drug delivery device with compressible drug reservoir

A medicament delivery device, which comprises a driving mechanism and a housing () having a reservoir (), which is at least partly filled with a substance and which is sealed at least on one side with a flexible wall (). The driving mechanism is adapted to press a piston () against the flexible wall () thereby releasing the substance from the reservoir () through an opening () in the reservoir (). This provides for a safe and reliable medicament delivery device.

Medicament delivery device, capsule and in vivo medicine delivery or diagnostic system

Growing community of inventors

Weert, Netherlands

Johan Frederik Dijksman