Kla Tencor Corporation

Icos Vision Systems Nv

Johan De Greeve

Guoheng Zhao

Karel Van Gils

Maarten Van Der Burgt

Sheng Liu

Andy Hill

Andrew V Hill

Stanley E Stokowski

Christophe Wouters

Kristiaan Van Rossen

Luc Vanderheydt

Laurent Hermans

Frans Nijs

Wojciech Grzegorczyk

Kristof Joris

Dominique Janssens

Filip Cauwenberghs

Benjamin Swerts

Pauline Begoc

Lieve Govaerts

Eric Delfosse

Francis Thissen

Koen Goorman

For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.

Method and system for optical three dimensional topography measurement

3D measurements of features on a workpiece, such as ball height, co-planarity, component thickness, or warpage, are determined. The system includes a broadband light source, a microlens array, a tunable color filter, a lens system, and a detector. The microlens array can focus a light beam to points in a focal plane of the microlens array. The tunable color filter can narrow the light beam to a band at a central wavelength. The lens system can provide longitudinal chromatic aberration whereby different wavelengths are imaged at different distances from the lens system.

Chromatic confocal area sensor

A method for shape classification of an object is provided. Shape categories are provided which specify a plane and points therein relative to the object, and also specify at least one limit coordinate for each such point, the limit coordinate defining a boundary in a direction normal to the plane for the shape of the object considered in order for the object to be classified into a respective shape category. The shape categories can be provided by a user, making the method very flexible. The shape categories can in particular be derived from a set of samples of objects representing a shape category to be defined. For classification, the position of a surface of the object is measured at each of the points defined in the shape category, and the result is compared with the corresponding limit coordinate.

Method for shape classification of an object

The invention relates to an image acquisition system and an image acquisition method, as well as to an inspection system having at least one such image acquisition system. A projector projects a pattern on a surface of a sample, a camera records light intensity information from within at least two detection fields defined by the camera on the surface of the sample. A relative motion between the sample on the one hand and the camera and projector on the other hand is generated. From the acquired at least one image a height profile of the surface of the sample may be inferred. The pattern may comprise a number of sub-patterns related to each other by a phase shift. Alternatively, the pattern may be a fringe pattern.

Image acquisition system, image acquisition method, and inspection system

An apparatus for illuminating monocrystalline and polycrystalline substrates in order to image micro cracks, pinholes and inclusions in the substrates is disclosed. A first illumination system illuminates a first line of light on the front surface of the substrate. A second illumination system illuminates a second line of light on the front surface of the substrate. The first line of light and the second line of light are oriented transverse to the transport direction (T). The second illumination system is arranged within a 3-dimensional coordinate system such that the substrate is illuminated under a second angle. The arrangement of the second illumination system is comparable to a street lamp. A camera, preferably a camera, is arranged such that it faces the back surface of the substrate. The camera captures light which is transmitted through the substrate from the first illumination system and the second illumination system.

Apparatus for illuminating substrates in order to image micro cracks, pinholes and inclusions in monocrystalline and polycrystalline substrates and method therefore

Provided are novel methods and systems for setting up ranges of optical inspection parameters. These ranges may be later used for inspection of photovoltaic cells for discoloration, for example. A set of values corresponding to an inspection parameter, such as hue, saturation, and intensity, is obtained from a set-up image. The image includes multiple set-up areas, e.g., a defined group of pixels, wherein each set-up area is assigned a corresponding value in the set. A test image is then constructed from multiple test areas that are also associated with the values in the set. Each test area is assigned a color from a set of user defined colors based on the corresponding value and user defined ranges. A user interface includes both a range diagram and test image, which are used to adjust the ranges in the diagram that result in modification of the test image. Adjusting is repeated until the test image meets predetermined criteria.

Apparatus and methods for setting up optical inspection parameters

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Brabant, Belgium

Johan De Greeve