Koninklijke Philips Corporation N.v.

U.S. Philips Corporation

Asml Netherlands B.v.

Micro Turbine Technology, Bv

Johan Cornelis Compter

Erik Roelof Loopstra

Petrus Carolus Maria Frissen

Sven Antoin Johan Hol

Jan Van Eijk

Patricia Vreugdewater

Arjan Franklin Bakker

Franciscus Martinus Roes

Petrus C M Frissen

Bernd Ackermann

George Arie Jan De Fockert

Thomas Petrus Hendricus Warmerdam

Angelo Cesar Peter De Klerk

Rob Otte

Hubert Gerard Jean Joseph Amaury Vroomen

Leo Honds

Funda Sahin Nomaler

Dennis Erwin Bos

Rob Tabor

Michael Josepha Mathijs Renkens

Rob Jacobus Matheus Coolen

Thomas P Warmerdam

Volker Kessler

Pingh-Shih Wang

Peter M Heijmans

Franciscus Lambertus Maria Cremers

Petrus Cm Frissen

Antonius Cornelis Petrus Maria Backx

Antonius Ta Peijnenburg

Maikel Marinus Wilhelmus Brands

Wilhelmus Albertus Maria Aarnink

Antonius T A Peijnenburg

Anthonius Johannes Dirk Verdel

Johannes M Van Geel

A method for suppressing vibrations, the method having the steps of providing a first device having a first rotating shaft, and a second device having a second rotating shaft. The orbits of the first rotating shaft are measured are analyzed, and the misalignment and unbalance is determined. The first rotating shaft and the bearings are then displaced to eliminate vibrations.

Integral method for vibration compensation and misalignment prevention in rotor dynamic systems

The present invention relates to a rotating ring apparatus comprising: &#x2014;a stationary ring (), &#x2014;a rotating ring () for rotation around a central region (), &#x2014;a rotation unit () for radially bearing and rotating said rotating ring () with respect to the stationery ring (), said rotation unit including a stationary induction element () mounted on said stationery ring () and a rotating induction element () mounted on said rotating ring (), and &#x2014;a controller () for controlling said rotation unit () to rotate and levitate the rotating induction element ().

Rotating ring apparatus

Especially for use in the semiconductor industry, a displacement device () is disclosed comprising a first part comprising a carrier () on which a system of magnets () is arranged according to a pattern of row and columns extending parallel to the X-direction and the Y-direction, respectively. The magnets in each row and column are arranged according to a Halbach array, i.e. the magnetic orientation of successive magnets in each row and each column rotates 90&#xb0; counter-clockwise. The second part comprises an electric coil system () with two types of electric coils, one type having an angular offset of +45&#xb0;, and the other type having an offset of &#x2212;45&#xb0; with respect to the X-direction. The first part () is movable over a range of centimeters or more with respect to the stationary second part (). For high precision positioning of the first part, an interferometer system () is provided.

Displacement device

An actuator driver circuit includes a drive signal source and an electrical damping element having a negative resistance connected in series with the drive signal source. A controllable switch is provided for selectively switching the electrical damping element into or put of a signal path from a drive signal source output to a driver circuit output, in order to selectively change the electrical damping of an actuator. For example, the electrical damping of a radial actuator or a focus actuator of an optical disc drive is increased in case of loss of track or loss of focus.

Method for driving an actuator, actuator drive, and apparatus comprising an actuator

A apparatus processes an object (), such as a semi-conductor wafer at accurately controlled positions. The object () is supported by a working platform () that is moveable along a path. A suspension actuator part () attached to the working platform (), contains a soft magnetic core () with poles facing the surface of a soft magnetic element () on the support structure along the path and a winding () for application of a current to generate a magnetic field that runs through the core () v the poles and returns via the soft magnetic element (). A sensor () senses a measured position of the suspension actuator part () relative to the position reference element (). A control circuit comprises an outer control circuit () and an inner control circuit (). The outer control circuit () receives a sensing result and determines force set point information to regulate the measured position of the actuator part () to a required value. The inner control circuit () receives the force set point information and controls the current to realize a force between the actuator part () and the support structure () according to the force set point information.

Apparatus for processing an object with high position accurancy

A displacement apparatus comprising a first part and a second part, which can be displaced relative to each other in first and second different directions. The apparatus being suitable for use in a lithographic apparatus for positioning the mask holder with respect to the projection beam and for positioning the wafer substrate table with respect to the patterned beam. The first part comprises a first and second coil system in which an alternating current is provided by a power supply. The second part comprises a conductive platen which is disposed in a zone in which a magnetic field is induced when power is supplied to the coil systems. The coil system and platen are arranged with respect to each other so that when currents are passed through the coils, a magnetic field induced in the platen causes displacement between the platen and the coils in the first and second different directions.

Displacement apparatus, litographic apparatus, device manufacturing method, and device manufactured thereby

A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.

Lithographic linear motor, lithographic apparatus, and device manufacturing method

A coil for use in an actuator in a lithographic projection apparatus. The coil is formed of a strip of electrically conducting sheet-material that is wound round a winding axis. Respective turns of the strip of sheet-material are separated by an electrically non-conducting layer.

Lithographic apparatus and device manufacturing method

A positioning device comprising a first part () which is movable relatively to a second part () in an X-direction and a Y-direction, said first part () comprising a carrier () on which a system of magnets () is arranged according to a pattern of rows () and columns () extending parallel to the X-direction and the Y-direction, respectively. The magnets in each row and column are arranged according to a Halbach array, i.e. the magnetic orientation of successive magnets in each row () and each column () rotates 90&#xb0; counter-clockwise. The second part () comprises an electric coil system () with two types of electric coils (C, C), one type having an angular offset of +45&#xb0;, and the other type having an offset of &#x2212;45&#xb0; with respect to the X-direction. The magnet configuration causes a very strong magnetic field.

Positioning device having a first part ( ) which is movable relative to a second part ( ) in a X and Y-direction, said first part ( ) having a carrier ( ) on which a system of magnets ( ) is arranged in a pattern of rows ( ) and columns ( ) parallel to the X- and Y-direction, respectively. The magnets in each row and column are arranged in a Halbach array, i.e. the magnetic orientation of each successive magnet in each row ( ) and each column ( ) is rotated through 90&deg; counter-clockwise. The second part ( ) has an electric coil system ( ) with two types of electric coils (C , C ), one type having an angular offset of &plus;45&deg; and the other type having an offset of &minus;45&deg; with respect to the X-direction. The magnet configuration causes a very strong magnetic field. The positioning device has a number of magnetically sensitive sensors (Hall sensors ) giving a signal which depends on the local mutual positions of the permanent magnets of the first part relative to the electric coils of the second part in an area in which the parts overlap.

A lithographic apparatus has a positioning system for positioning an object table. The positioning system includes a planar motor having a stator and a translator, one comprising a periodic magnet structure and the other comprising a plurality of coils. The phase relationship between the stator and translator is determined by energizing at least some of the coils with an oscillating signal sufficient to cause vibrations of the translator, measuring the vibrations, and determining the phase relationship between the translator and stator on the basis of the measured vibrations. Alternatively, the relationship between stator and translator may be determined by detecting distinct optical marks on the periodic magnet array.

Lithographic projection apparatus positioning system, method of manufacturing, device manufactured thereby and computer program

The invention relates to a resistor assembly for dividing an applied voltage into an intermediate voltage being below the applied anode voltage in a cathode ray tube. The resistor assembly comprises an insulating substrate and a resistive voltage divider including a first and a second resistive layer provided on the insulating substrate, and an additional resistive network with a first network terminal and a second network terminal. The additional resistive network is coupled in series with the first resistive layer. Furthermore, the additional resistive network comprises first and second resistive portions which are releasably coupled to the network terminals via bridge connections. According to the invention, the first and second resistive portions have substantially different resistance values for selecting a predetermined resistance value from a range of resistance values of the additional resistive network.

Resistor assembly and cathode ray tube

A positioning device comprising a first part ( ) which is movable relatively to a second part ( ) in an X-direction and a Y-direction, said first part ( ) comprising a carrier ( ) on which a system of magnets ( ) is arranged according to a pattern of rows ( ) and columns ( ) extending parallel to the X-direction and the Y-direction, respectively. The magnets in each row and column are arranged according to a Halbach array, i.e. the magnetic orientation of successive magnets in each row ( ) and each column ( ) rotates 90&deg; counter-clockwise. The second part ( ) comprises an electric coil system ( ) with two types of electric coils (C , C ), one type having an angular offset of &plus;45&deg;, and the other type having an offset of &minus;45&deg; with respect to the X-direction. The magnet configuration causes a very strong magnetic field.

A motion damper (1) with a first part (3) and a second part (5) which are mutually displaceable parallel to a damping direction (X). The first part (3) including a permanent magnet system (35), and the second part (5) including an electric actuator coil (25) which is positioned in the magnetic field of the magnet system (35). According to the invention, the motion damper (1) including an electrical amplifier (53) for amplifying an electric current generated in the actuator coil (25) under the influence of a movement of the actuator coil (25) in the magnetic field of the magnet system (35). Since the electric current is amplified, the interaction between the electric current and the magnetic field of the magnet system (35) provides a sufficient electromagnetic damping force with a substantially ideal linear damping characteristic. In a special embodiment, the motion damper including two substantially identical measuring coils (27, 29) which are arranged on either side of the actuator coil (25), and two mutually oppositely magnetized magnet systems (37, 39) for cooperating with the measuring coils (27, 29), while the amplifier (53) supplies the actuator coil (25) with a current which is proportional to a difference between the currents generated in the measuring coils (27, 29). The motion damper (1) is used in a lithographic device (57) for the manufacture of semiconductor substrates (75). The motion damper (1) serves to prevent vibrations of a plate (91) relative to a focusing unit (65) of the lithographic device (57), which plate (91) supports a position measuring system (87) of the lithographic device (57).

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Eindhoven, Netherlands

Johan Cornelis Compter