Asml Netherlands B.v.

Fei Comapny

Carl Zeiss Smt Gmbh

Joeri Lof

Alexander Straaijer

Erik Roelof Loopstra

Johannes Catharinus Hubertus Mulkens

Klaus Simon

Bob Streefkerk

Christiaan Alexander Hoogendam

Sjoerd Nicolaas Lambertus Donders

Joannes Theodoor De Smit

Antonius Theodorus Anna Maria Derksen

Roelof Aeilko Siebrand Ritsema

Jeroen Johannes Sophia Maria Mertens

Helmar Van Santen

Aleksey Yurievich Kolesnychenko

Hendricus Johannes Maria Meijer

Timotheus Franciscus Sengers

Hans Butler

Frank Van Schaik

Erik Theodorus Maria Bijlaart

Theodorus Marinus Modderman

Hans Jansen

Jacobus Johannus Leonardus Hendricus Verspay

Arie Jeffrey Den Boef

Johannes Jacobus Matheus Baselmans

Joost Jeroen Ottens

Marcus Adrianus Van De Kerkhof

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Frits Van Der Meulen

Mark Kroon

Bernardus Antonius Slaghekke

Martijn Houkes

Gerardus Petrus Matthijs Van Nunen

Henricus Wilhelmus Maria Van Buel

Fransiscus Godefridus Casper Bijnen

Gerrit Cornelis Van Hoften

Wim Tjibbo Tel

Frank Staals

Cheng-Qun Gui

Frank Jeroen Pieter Schuurmans

Bearrach Moest

Timo Laufer

Petrus Theodorus Rutgers

Arthur Winfried Eduardus Minnaert

Richard Henderson

Michael Alwin William Stekelenburg

Nicola Carlo Guerrini

Gregory James McMullan

Abdul Raffey Faruqi

Renato Andrea Danilo Turchetta

Harmen Krediet

Gerardus Petrus Mattijs Van Nunen

Arno Jan Bleeker

Harmeet Singh

Levinus Pieter Bakker

Pieter Willem Herman De Jager

Harmen Klaas Van Der Schoot

Marcel Beckers

Sven Antoin Johan Hol

Ronald Van Der Ham

Bernardus Antonius Johannes Luttikhuis

Willem Jurrianus Venema

Joseph Consolini

Anastasius Jacobus Anicetus Bruinsma

Johannes Antonius Gerardus Akkermans

Keith Best

Raimond Visser

Antonius Johannes Van Der Net

Nicolas Alban Lallemant

Peter Michel Silvester Maria Heijmans

Michael Johannes Vervoordeldonk

Erik Marie Jose Smeets

Maximus Theodorus Otten

Gerardus Johannes Joseph Keijsers

Peter Spit

Aleksey Yurievich Kolensnychenko

Maurice Anton Jaques Teuwen

Johannes Wilhelmus Maria Krikhaar

Sjoerd Martijn Huiberts

Martin Dieter Nico Peters

Eduardus Johannes Gerardus Boon

Robertus Victorius Maria Scheepens

Jeroen Fluit

Jeroen Hendrik Gerardus Christiaan Rutten

Edwin Ross Shafer

Hubertus Jacobus Maria Van Beijsterveldt

Joannes Theodor De Smit

Bas Pieter Lemmen

Roelof Aeilko Siebranc Ritsema

Joost Kauffman

Martijn Hendrikus Wilhelmus Stopel

Gerard Van Den Eijkel

A method for temperature control of a component that is transferable between a first system and a second system includes: ascertaining a temperature drift of a temperature of the component that is to be expected after transfer of the component from the first system into the second system; and modifying a temperature prevailing in the first system and/or a temperature prevailing in the second system such that the temperature drift that is actually occurring after transfer of the component from the first system into the second system is reduced with respect to the expected temperature drift.

Method for temperature control of a component

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.

Method of calibrating a reluctance actuator assembly, reluctance actuator and lithographic apparatus comprising such reluctance actuator

A substrate handling system for handling a substrate, the substrate handling system including a holder for holding the substrate, a rotation device for rotating the holder around an axis perpendicular to a plane, and a mover for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus including the substrate handling system. The substrate handling system may include a coupling device arranged to couple the holder to the mover or the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the mover or rotation device in a second situation.

Substrate handling system and lithographic apparatus

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Eindhoven, Netherlands

Joeri Lof