Oerlikon Surface Solutions Ag, Pfaffikon

Sulzer Metaplas Gmbh

Oerlikon Metaplas Gmbh

Metaplas Ionon Oberflachenveredelungstechnik Gmbh

Oerlikon Surface Solutions Ag, Truebbach

Joerg Vetter

Georg Erkens

Stefan Esser

Juergen Mueller

Markus Willach

Jurgen Mueller

The present invention relates to a method for the evaporation of a cathode by means of cathodic arc evaporation, wherein the focal spot of the arc is forced to a predetermined track on the cathode surface by means of temporally and spatially controllable magnetic fields, wherein a predetermined removal of material of the cathode surface is produced. The invention also relates to a device for carrying out the method according to the invention.

Cathodic arc evaporation with predetermined cathode material removal

An electric-arc evaporation method for coating surfaces, wherein at least two active consumption targets are used in the method, characterized in that the consumption targets are alternately connected as a cathode and an anode during the coating process.

Bipolar arc-coating method

The present disclosure relates to a coated substrate having a hard material coating, which comprises a hard carbon layer of the hydrogen-free amorphous carbon layer type, wherein the coating comprises a layer consisting of zirconium between the substrate and the hydrogen-free amorphous carbon layer; wherein between the layer consisting of zirconium and the hydrogen-free amorphous carbon layer, a layer consisting of Zr&#x2014;Ccan be formed in which a zirconium monocarbide is formed; and the layer consisting of Zr&#x2014;Cand comprising zirconium monocarbide is applied directly to the adhesive layer consisting of zirconium.

Hydrogen-free carbon coating having zirconium adhesive layer

Cylindrical evaporation source which includes, at an outer cylinder wall, target material to be evaporated as well as a first magnetic field source and a second magnetic field source which form at least a part of a magnet system and are arranged in an interior of the cylindrical evaporation source for generating a magnetic field. In this respect, first magnetic field source and second magnetic field source are provided at a carrier system such that a shape and/or a strength of the magnetic field can be set in a predefinable spatial region in accordance with a predefinable scheme. In embodiments, the carrier system is configured for setting the shape and/or strength of the magnetic field of the carrier system such that the first magnetic field source is arranged at a first carrier arm and is pivotable by a predefinable pivot angle (&#x3b1;) with respect to a first pivot axis.

Cylindrical evaporation source

Evaporation source, in particular for use in a sputtering process or in a vacuum arc evaporation process, preferably a cathode vacuum arc evaporation process. The evaporation source includes an inner base body which is arranged in an outer carrier body and which is arranged with respect to the outer carrier body such that a cooling space in flow communication with an inlet and an outlet is formed between the base body and the carrier body. In accordance with the invention, the cooling space includes an inflow space and an outflow space, and the inflow space is in flow communication with the outflow space via an overflow connection for the cooling of the evaporation source such that a cooling fluid can be conveyed from the inlet via the inflow space the overflow connection and the outflow space to the outlet.

Evaporation source

The invention relates to a vacuum arc source (), including ring-like magnetic field source () and a cathode body () with an vaporization material () as a cathode () for the production of an arc discharge on an vaporization surface () of the cathode (). In this arrangement the cathode body () is bounded in an axial direction in a first axial direction by a cathode base () and in a second axial direction by the vaporization surface () and the ring-like magnetic () is arranged polarised parallel or anti-parallel and concentric to a surface normal () of the vaporization surface (). In accordance with the invention a magnetic field enhancement ring () is arranged on a side remote from the vaporization surface () at a pre-determinable second spacing (A) in front of the cathode base (). The invention further relates to an arc vaporization chamber () with an arc vaporization source ().

Vacuum arc vaporisation source and also a vacuum arc vaporisation chamber with a vacuum arc vaporisation source

The invention thus relates to a layer system () for the formation of a surface layer on a surface of a substrate, in particular on the surface of a tool, in particular on the surface of a shaping tool, wherein the layer system includes at least a first surface layer of the composition (VMeMX)(NCO), where (a+b+c+d)=&#x3b1;, &#x3b1;=100%, with respect to the atoms V,Me,M,Xpresent in the layer, (u+v+w)=&#x3b2;. &#x3b2;=100 with respect to the atoms N, C, O present in the layer, with the sum of all the atoms in the layer (&#x3b1;+&#x3b2;)=100 at %, where 40&#x2266;&#x3b1;&#x2266;80 at % applies, and where Meis at least one element from the group of chemical elements including Zr, Hf, Nb, Ta, Mo, W, Ni, Cu, Sc, Y, La, Ce, Pr, Nd, Pm, Sm of the periodic system of chemical elements and Mis at least one element of the group of chemical elements including Ti, Cr, and Xis at least one element from the group of chemical elements including S, Se, Si, B of the periodic system of elements, where 0&#x2266;u&#x2266;100, 0&#x2266;v&#x2266;100 and 0&#x2266;w&#x2266;80. In accordance with the invention 50&#x2266;a&#x2266;99, 1&#x2266;b&#x2266;50, 0&#x2266;c&#x2266;50 and 0&#x2266;d&#x2266;20.

Layer system for the formation of a surface layer on a surface of a substrate and coating method for the manufacture of a layer system

The invention relates to a layer arrangement () for the formation of a coating on a surface () of a substrate (), in particular on the surface () of a tool (), wherein the layer arrangement comprises at least one hard layer () having the composition SiBMeNCOwith a,b&#x3e;0 and 33 at %&#x3e;c &#x2267;0, preferably 25 at %&#x3e;c&#x2267;0, in particular 10 at %&#x3e;c&#x2267;0 and u,v,w&#x2267;0, and Me being a metal. Furthermore, the invention relates to a coating method for depositing a layer arrangement (), as well as to a substrate (), in particular a tool () or a wearing part () having a layer arrangement () according to the invention.

Layer arrangement for the formation of a coating on a surface of a substrate, coating method, and substrate with a layer arrangement

The carbon-containing hard coating (1) according to the invention comprises nano-crystalline grains being separated from each other by grain boundaries, wherein said hard coating comprises aluminum (Al), at least one additional metal (Me1, Me2), carbon (C) and at least one further element (E1, E2) and has the chemical composition:(AlMe1Me2)CE1E2wherein Me1 is a metal, and Me2 is a metal, with x&#x3e;0.4 and x+y+z=1 and y,z&#x2267;0, and E1 and E2 are further chemical elements with 1&#x3e;u&#x3e;0 and u+v+w=1 and v,w&#x2267;0. The grain boundaries have a higher concentration of carbon atoms than the nano-crystalline grains.

Growing community of inventors

Bergisch Gladbach, Germany

Joerg Vetter