Carl Zeiss Smt Gmbh

Joerg Specht

Jan Horn

Markus Holz

Johannes Eisenmenger

Stefan Krone

An external facility is used to control positioning of multiple displaceable mirror elements of a multi-mirror arrangement. The external facility is to a multi-mirror arrangement via a data channel having a bandwidth of at least 1 kHz per controlled degree of freedom of displacement.

Device and method for controlling positioning of multiple adjustable mirror elements in a multi-mirror arrangement

An apparatus for establishing a tilt angle of at least one mirror of a lithography installation is disclosed. The apparatus includes a pattern generating device () for generating a pattern. The apparatus also includes an image acquisition device for acquiring the generated pattern which was reflected by the mirror. The apparatus further includes a comparator device for providing a comparison result in a manner dependent on a comparison of the acquired pattern with a reference pattern. In addition, the apparatus includes an evaluation device for establishing the tilt angle in a manner dependent on the comparison result. The image acquisition device and the comparator device are provided in the same integrated circuit.

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Koenigsbronn, Germany

Joerg Specht