Oerlikon Surface Solutions Ag, Pfaffikon

Oberlikon Solar Ag, Trubbach

Joerg Kerschbaumer

Siegfried Krassnitzer

Juerg Hagmann

Hamid Bolvardi

Stefan Schneider

Markus Esselbach

Arno Zindel

Arno Moosbrugger

Mario Wolfgang Walch

Mark Andreas

Theo Bachmann

The present invention discloses a target assembly which allows safe, fracture-free and economic operation of target materials with low fracture toughness and/or bending strength during arc evaporation processes as well as in sputtering processes. The present invention discloses a target assembly for PVD processes, comprising a target, and a target holding device (), characterized in that the target () comprises a first bayonet lock and the target holding device () comprises a counterbody for the first bayonet lock of the target and a second bayonet lock for engaging the target assembly in the cooling means of the deposition chamber.

Target assembly for safe and economic evaporation of brittle materials

A system that has a plate with a holder, in which the plate is centered in the holder both at room temperatures and at higher temperatures, independently of the thermal expansion of the plate and the holder, and in which the plate can freely expand in the holder at higher temperatures.

Centering of a plate in a holder both at room temperatures and at higher temperatures

A plate-centering system that has a plate with a holder, in which the plate is centered in the holder both at room temperature and at higher temperatures, independently of the thermal expansion of the plate and the holder, and the plate can freely expand in the holder at higher temperatures. The invention relates in particular to a target having a frame-shaped target mount, which is very well suited for use in a coating source for high power pulsed magnetron sputtering of the target.

Sputtering target having increased power compatibility

A cover for a roller having at least one roller () for transporting a substrate () in a deposition system and at least one cover means (), wherein the roller is retractable away from the substrate and the cover means is adapted for at least partly covering the retracted roller against contamination by a substance present in the deposition system. The cover for a roller has the advantage that the uptime of the deposition system is increased.

Cover for a roller

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Feldkirch, Austria

Joerg Kerschbaumer