Nanoscribe Gmbh

Joerg Hoffmann

Michael Thiel

Martin Hermatschweiler

Roman Reinhard Reiner

Yann Tanguy

Holger Fischer

Philipp Simon

A method for producing a three-dimensional overall structure () by a structuring device (), which has a predefined principal direction () of the structure entry in a writing region (). The overall structure () is defined by sequential definition of a plurality of partial structures () that complement one another overall to form the overall structure (). The partial structures () are delimited in each case within enveloping interfaces (). In this case, the partial structures () are chosen in such a way that the enveloping interfaces () extend obliquely with respect to the principal direction () of the structure entry.

Process for producing a three-dimensional structure

The invention relates to a method for producing a structure in a lithographic material, wherein the structure in the lithographic material is defined by means of a writing beam of an exposure device, in that a plurality of partial structures are written sequentially, wherein for writing the partial structures a write field of the exposure device is displaced and positioned sequentially and that a partial structure is written in the write field in each case, and wherein for positioning of the write field a reference structure is detected by means of an imaging measuring device. For calibration of the write field in the respectively positioned write field, before, during or after writing a partial structure, at least one reference structure element assigned to this partial structure is produced in the lithographic material with the writing beam, wherein the reference structure element after the displacement of the write field is detected by means of the imaging measuring device for writing a further partial structure.

Method for producing a structure

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Lustadt, Germany

Joerg Hoffmann