Robert Boschgmbh

Joerg Hauer

Burkhard Kuhlmann

Reinhard Neul

Johannes Classen

Daniel Christoph Meisel

Udo-Martin Gomez

Torsten Ohms

Markus Lutz

Jochen Franz

Wolfram Bauer

Christian Doering

Rainer Willig

Udo Bischof

Karsten Funk

Axel Franke

Michael Fehrenbach

Kersten Kehr

Oliver Kohn

Andreas Thomae

Gerhard Wucher

Siegbert Goetz

Jens Frey

Dieter Maurer

Christoph Lang

Robert Sattler

Andreas Kipp

Thorsten Balslink

Christoph Gauger

Martin Wrede

Carsten Geckeler

Udo Gomez

Marco Quander

Siegbert Geotz

Burhard Kuhlmann

A yaw-rate sensor having a substrate and a plurality of movable substructures that are mounted over a surface of the substrate, the movable substructures being coupled to a shared, in particular, central spring element, means being provided for exciting the movable substructures into a coupled oscillation in a plane that extends parallel to the surface of the substrate, the movable substructures having Coriolis elements, means being provided for detecting deflections of the Coriolis elements induced by a Coriolis force, a first Coriolis element being provided for detecting a yaw rate about a first axis, a second Coriolis element being provided for detecting a yaw rate about a second axis, the second axis being oriented perpendicularly to the first axis.

Yaw-rate sensor

A yaw rate sensor includes a drive mass element which is situated above a surface of a substrate and is drivable to vibrate by a drive device along a first axis extending along the surface, having a detection mass element, which is deflectable under the influence of a Coriolis force along a second axis perpendicular to the surface, and having a detection device by which the deflection of the detection mass element along the second axis is detectable. Due to the arrangement of the second axis perpendicular to the surface, the yaw rate sensor may be integrated into a chip together with additional yaw rate sensors suitable for detection of rotations about axes of rotation in other directions.

Yaw rate sensor

A yaw-rate sensor having a substrate and a plurality of movable substructures that are mounted over a surface of the substrate, the movable substructures being coupled to a shared, in particular, central spring element, where the movable substructures are excitable into a coupled oscillation in a plane that extends parallel to the surface of the substrate, the movable substructures having Coriolis elements, where deflections of the Coriolis elements induced by a Coriolis force are detectable, a first Coriolis element being provided for detecting a yaw rate about a first axis, a second Coriolis element being provided for detecting a yaw rate about a second axis, the second axis being oriented perpendicularly to the first axis.

A yaw rate sensor having a substrate which has a main plane of extension, and a Coriolis element is proposed. The Coriolis element is excitable to a vibration along a third direction which is perpendicular to the main plane of extension. A Coriolis deflection of the Coriolis element along a first direction which is parallel to the main plane of extension may be detected using a detection arrangement. The detection arrangement includes a Coriolis electrode which is connected to the Coriolis element, and a corresponding counterelectrode. Both the Coriolis electrode and the counterelectrode may be excited to a vibration along the third direction.

Yaw rate sensor, yaw rate sensor system, and method for operating a yaw rate sensor

A coupling structure for a rotation rate sensor apparatus, having at least one first oscillating mass; and having a first frame, surrounding the first oscillating mass, to which the first oscillating mass is coupled; the first frame encompassing four angle elements, each of which angle elements has at least one first limb and one second limb and is respectively coupled with the first limb and with the second limb to another adjacent angle element of the four angle elements. Also described is a further coupling structure for a rotation rate sensor apparatus, to a rotation rate sensor apparatus, to a manufacturing method for a coupling structure for a rotation rate sensor apparatus, and to a manufacturing method for a rotation rate sensor apparatus.

Coupling structure for a yaw rate sensor device, yaw rate sensor device, and method for the production thereof

A rotation-rate sensor includes a substrate having a surface, a movable element situated above the surface, which is deflectable based on a Coriolis force along a first axis that runs perpendicular to the surface, a driving device which is prepared to activate the movable element along a second axis that runs parallel to the surface, a compensation device, in order to generate an electrostatic force along the first axis, including electrodes corresponding to one another, developed on the substrate and on the movable element; a relative degree of covering of the electrodes in the direction of the first axis being a function of the deflection of the movable element along the second axis; and the electrode developed on the movable element runs around an insulating region of the movable element.

Quadrature compensation for a rotation-rate sensor

A micromechanical sensor having at least one movably mounted measuring element which is opposite at least one stationary electrode, the electrode being situated in a first plane, and being contacted by at least one printed conductor track which is situated in a second plane. A third plane is located between the first plane and the second plane, the third plane including an electrically conductive material.

Micromechanical sensor

A rotation rate sensor includes: a mounting device; a first drive frame having a drive, which is designed to set the first drive frame into a first oscillatory motion along an axis of oscillation relative to the mounting device; a first stator electrode; a first actuator electrode coupled to the first drive frame in such a way that in a rotary motion of the rotation rate sensor due to a Coriolis force, the first actuator electrode being displaceable in a first deflection direction relative to the first stator electrode; and an evaluation device configured to determine a voltage applied between the first stator electrode and the first actuator electrode, and to specify information regarding the rotary motion of the rotation rate sensor while taking the determined voltage value into account.

Rotation rate sensor

A micromechanical yaw-rate sensor comprising a first yaw-rate sensor element, which outputs a first sensor signal, which contains information about a rotation around a first rotational axis, a second yaw-rate sensor element, which outputs a second sensor signal, which contains information about a rotation around a second rotational axis, which is perpendicular to the first rotational axis, a drive, which drives the first yaw-rate sensor element, and a coupling link, which mechanically couples the first yaw-rate sensor element and the second yaw-rate sensor element to one another, so that driving of the first yaw-rate sensor element also causes driving of the second yaw-rate sensor element.

Micromechanical yaw-rate sensor

A rotation rate sensor includes a substrate having a main extension plane, and a Coriolis element movable relative to the substrate, the Coriolis element being provided to be excitable to perform an oscillation deflection substantially parallel to the main extension plane; and the Coriolis element further being provided to be deflectable, by way of a Coriolis force acting on the Coriolis element, to perform a detectable Coriolis deflection perpendicular to the main extension plane; and the rotation rate sensor further including at least one compensation electrode that is provided for at least partial compensation, as a function of the oscillation deflection, for a levitation force acting on the Coriolis element.

Rotation rate sensor and method for operating a rotation rate sensor

A rotation rate sensor having a substrate and a Coriolis element is proposed, the Coriolis element being situated above a surface of a substrate; the Coriolis element being able to be induced to vibrate in parallel to a first axis (X); an excursion of the Coriolis element being detectable, based on a Coriolis force in a second axis (Y), which is provided to be essentially perpendicular to the first axis (X); the first and second axes (X, Y) being provided parallel to the surface of the substrate, wherein force-conveying means are provided, the means being provided to convey a dynamic force effect between the substrate and the Coriolis element.

A rotational rate sensor having a substrate and a Coriolis element is proposed, the Coriolis element being situated over a surface of a substrate; a driving arrangement being provided, by which the Coriolis element is induced to vibrations parallel to a first axis; a detection arrangement being provided, by which an excursion of the Coriolis elements is detectable on the basis of a Coriolis force in a second axis that is provided to be essentially perpendicular to the first axis; the first and second axis being parallel to the surface of the substrate; sensor elements that are designated to be at least partially movable with respect to the substrate being provided; a force-conveying arrangement being provided; the force-conveying arrangement being provided to convey a static force effect between the substrate and at least one of the sensor elements.

Rotational rate sensor

A micromechanical rotation-rate sensor includes a substrate, an anchoring device provided on the substrate, as well as a first spiral spring device and a second spiral spring device, the two spiral spring devices being provided next to one another in mirror symmetry along their greatest extension, and the two spiral spring devices together form one spiral spring apparatus. The sensor further includes a centrifugal mass connected to the anchoring device via the first spiral spring device connected to the centrifugal mass so that the centrifugal mass is elastically deflectable from its neutral position, about a rotational axis situated perpendicularly to a substrate surface, so that the centrifugal mass is capable of rotary oscillation. In addition, the first spiral spring device includes a bend at its anchoring region with the anchoring device.

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Reutlingen, Germany

Joerg Hauer