Carl Zeiss Smt Gmbh

Carl-Zeiss-Smt Ag

Carl Zelss Smt Ag

Jochen Weber

Hubert Holderer

Wolfgang Hummel

Toralf Gruner

Markus Hauf

Arif Kazi

Erich Merz

Baerbel Schwaer

Ulrich Weber

Sascha Bleidistel

Alexander Kohl

Johannes Lippert

Thorsten Rassel

Karl-Eugen Aubele

Klaus Rief

Payam Tayebati

Markus Neumaier

Raoul Reiner

Juergen Fischer

Michael Muehlbeyer

Ole Fluegge

Stefan Schoengart

Wolfgang Singer

Alexander Epple

Heiko Feldmann

Norbert Wabra

Susanne Beder

Helmut Beierl

Ulrich Schoenhoff

Olaf Rogalsky

Alexander Sauerhoefer

Michael Thier

Gerhard Focht

Baerbel Trossbach

Boris Bittner

Eric Eva

Olaf Conradi

Ari Kazi

Aksel Goehnermeier

Dirk Hellweg

Martin Mahlmann

Stephan Back

Tilmann Heil

Michael Mühlbeyer

Benjamin Sigel

Peter Kloesch

Andreas Bertele

Kai-Uwe Berroth

Cornelia Buehler

Jürgen Fischer

Stefan Schöngart

Bärbel Trossbach

Reiner Raoul

A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

Projection lens system of a microlithographic projection exposure installation

The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Projection exposure apparatus for semiconductor lithography including an actuator system

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Optical element and method

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.

Optical correction device

A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Projection objective of a microlithographic projection exposure apparatus

In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.

Optical assembly, projection exposure apparatus and projection objective

Imaging device in a projection exposure machine

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Growing community of inventors

Heidenheim-Grosskuchen, Germany

Jochen Weber