Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Ulis Sas

Jochen Quenzer

Wolfgang Reinert

Sebastien Tinnes

Cécile Roman

Kai Gruber

Stephan Warnat

Cecile Roman

Infrared radiation micro device, cover for such a device and method for its fabrication, the device comprising a substrate and a cover and an infrared radiation detecting, emitting or reflecting infrared micro unit, the infrared micro unit being arranged in a cavity defined between the substrate and the cover, the cover comprising an antireflective surface texture to enhance the transmissibility of infrared radiation, wherein a distance frame formed in an additive process on the substrate side of the cover and/or the cover side of the substrate is arranged between substrate and cover.

Housing for an infrared radiation micro device and method for fabricating such housing

The present invention relates to a method for forming a micro-surface structure on a substrate, in particular for producing a micro-electromechanical component, a micro-surface structure of this type, a method for producing a micro-electromechanical component having a micro-surface structure of this type and such a micro-electromechanical component. The invention is particularly relevant for components of microsystem technology (MST, micro-electromechanical systems MEMS) and the construction and connection technology for hermetically housing micro components, preferably using getter materials.

Method for forming a micro-surface structure and for producing a micro-electromechanical component

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Itzehoe, Germany

Jochen Quenzer