Carl Zeiss Smt Gmbh

Jochen Haeussler

Boris Bittner

Thomas Petasch

Olaf Rogalsky

Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.

Lithographic projection objective

Projection objectives, related systems and components, and methods are disclosed. The methods include providing a projection objective of a lithography projection exposure apparatus, where the projection objective includes a plurality of optical elements between an object plane of the projection objective and an image plane of the projection objective, and the plurality of optical elements includes a first optical element having a refractive power and being disposed in the projection objective at a first location. The methods also include removing the first optical element from the projection objective, and inserting a first spare optical element into the projection objective at the first location, where the removing and inserting steps are performed at a location of use of the lithography projection exposure apparatus in a lithography process.

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Hermaringen, Germany

Jochen Haeussler