Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Asm International N.v.

Corus Technology B.v.

Joannes Leonard Linden

Mauritius Cornelis Maria Van De Sanden

Gregory Robert Alcott

Johannes Alphonsus Franciscus Maria Schade Van Westrum

Edward Aloys Gerard Hamers

Johannes Franciscus Maria Velthuis

Mariadriana Creatore

Johannes Franciscus Velthuis

Johannes Alphonsus Schade Van Westrum

The present invention describes a method for manufacturing a low dielectric constant coating, which coating comprises an inorganic and an organic component, wherein precursors for these components are activated in at least two plasma sources for plasma activated deposition of a chemical vapor phase and wherein said activated precursors are combined before they are deposited from the chemical vapor phase on the substrate to form the coating, characterized in that said inorganic component comprises porous nanoparticles. The invention also describes a device for the manufacture of a low dielectric constant coating.

Coatings, and methods and devices for the manufacture thereof

The present invention describes a method for applying a hybrid coating to a substrate. A coating according to the invention is formed by an inorganic component and an organic component. As a result, this coating has the hybrid character whereby the advantages of inter alia hardness are combined with flexibility. The invention also describes a device for the manufacture of a hybrid coating.

Method for depositing inorganic/organic films

The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapor deposition under choking conditions.

Process for coating substrates using vapour deposition

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Eindhoven, Netherlands

Joannes Leonard Linden