Trumpf Lasersystems for Semiconductor Manufacturing Gmbh

Trumpf Laser- Und Systemtechnik Gmbh

Trumpf Corporation

Joachim Schulz

Martin Lambert

Jochen Deile

Matthias Wissert

Guenther Krauss

Martin Bea

Hartmut Zefferer

Marc Weber

Matthias Schmitt

Oliver Mueller

Günther Krauss

An arrangement monitors an optical element. The arrangement includes: a light source configured to emit radiation onto a surface of the optical element; a detector configured to detect the radiation that has been at least partially reflected at the surface of the optical element; and a holder for the optical element, in which the light source and the detector are integrated. The holder has a cooling region through which a cooling liquid is configured to flow, the cooling region being in contact with the optical element. The holder has a reservoir, through which a beam path between the light source and the detector extends. The reservoir is configured to receive the cooling liquid leaking out at the optical element in case of a leakage.

Arrangement for monitoring an optical element, laser source and euv radiation generation apparatus

Methods, devices, and systems for elongating a beam path of a light beam, in particular of a laser beam, are provided. An example method includes coupling the light beam into an interspace between a plurality of first reflective surfaces and a plurality of second reflective surfaces facing the first reflective surfaces, multiply reflecting the light beam between the first reflective surfaces and the second reflective surfaces to elongate the beam path of the light beam, and coupling out the light beam from the interspace. The light beam undergoes the steps of coupling in, repeated reflecting and coupling out at least a first time with a first pass and a second time with a second pass, and the light beam traverses a different beam path in the interspace during the first pass in comparison with during the second pass.

Elongating a travel path of a light beam by an optical delay device

Systems, methods, and apparatus, including non-transitory computer-readable storage medium, for amplifying pulsed laser radiation in an EUV laser driver are provided. An example EUV laser driver includes a beam source configured to produce the pulsed laser radiation with at least one laser frequency, an amplifier arrangement with at least one optical amplifier for amplifying the pulsed laser radiation, the at least one optical amplifier having a frequency-dependent gain with a maximum gain at a maximum frequency, at least one frequency shifter configured to produce a frequency shift for the laser frequency of the pulsed laser radiation relative to the maximum frequency, and a controller configured to set the frequency shift such that a gain of the at least one optical amplifier for the pulsed laser radiation is reduced to less than a percentage, e.g., 90%, 70%, or 50%, of the maximum gain.

Amplifying pulsed laser radiation for EUV radiation production

A device includes a driver laser arrangement including a beam source for generating a laser beam and an amplifier arrangement for amplifying the laser beam. The device also includes an apparatus for monitoring the laser beam that includes a transmissive optical element having a normal direction oriented at a tilt angle with respect to a beam axis of the laser beam. The apparatus also includes a spatially resolving detector for registering laser radiation reflected backwards by the transmissive optical element. The transmissive optical element has first and second sides that are oriented at a wedge angle with respect to one another and through which the laser beam passes. The first and second sides reflect first and second partial beams of the incident laser beam. The apparatus has an optical filter that prevents one of the reflected first and second partial beams from reaching the detector.

Monitoring laser beams

An extreme ultraviolet radiation generating device includes a source operable to generate a first and second entrance beam, and a beam unit operable to modify at least one of a direction and a beam divergence of the first and second entrance beam, in which the beam unit includes: a beam splitter to receive the first and second entrance beam, the beam splitter being configured to reflect the first entrance beam as a first exit beam and to transmit the second entrance beam; and a mirror in the beam path of the transmitted, second entrance beam to reflect the second entrance beam to form a second exit beam that is transmitted by the beam splitter and that is at least partially superposed on the first exit beam, in which the beam unit is configured to modify an angle and/or beam divergence between the first and second exit beam.

EUV radiation generating device including a beam influencing optical unit

A device for amplifying a laser beam is provided. The device includes at least one amplifier chamber in which a laser-active material is provided, at least one transmitting optical member delimiting the amplifier chamber and being arranged at a tilt angle, &#x3b1;, with respect to a plane oriented perpendicularly with respect to an optical axis of the laser beam, and at least one detection unit. The laser beam is reflected by the transmitting optical member into a back reflected laser beam, and the detection unit is arranged such that it detects the back reflected laser beam.

Device for amplifying a laser beam

An Extreme Ultra-Violet (EUV) excitation light source has a beam guide device for manipulating at least one laser beam is provided. The beam guide device comprises at least one beam splitter for generating at least two separated beams from at least one laser beam, at least one mirror or a lens for manipulating at least one of the separated beams, a superposition mirror for superposing the at least two separated beams, and a focusing appliance for generating a respective focus for each of the at least two separated beams. At least two focuses can be generated at one identical location or at two different locations by the beam guide device.

EUV excitation light source with a laser beam source and a beam guide device for manipulating the laser beam

A device for laser processing, in which the device includes: a laser including a resonator, the resonator being configured to generate a laser beam with a predetermined caustic during operation of the device; and an optical element to transform a laser beam generated by the resonator into a transformed laser beam having an annular intensity distribution in a plane perpendicular to a propagation direction of the transformed laser beam during operation of the device, in which the annular intensity distribution extends along the propagation direction of the transformed laser beam, and has, at a minimum diameter of a caustic of the transformed laser beam, a beam radius and a ring width corresponding to 50% of a maximum beam intensity in a radial direction of the transformed laser beam, and a ratio of the ring width to the beam radius is less than 0.6.

Device and method for laser processing

An apparatus for monitoring a temperature and/or a temperature-dependent parameter of an optical element arranged in a path of a laser beam includes a measuring light source to produce measuring radiation and direct the measuring radiation to the optical element, a detector arranged to detect a portion of the measuring radiation that has passed through a passage region of the optical element, an evaluating device connected to the detector to monitor the temperature and/or the temperature-dependent parameter. The evaluating device is configured to determine the temperature and/or the temperature-dependent parameter based on an intensity of the measuring radiation detected by the detector in the passage region.

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Gerlingen, Germany

Joachim Schulz