Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Joachim Schroeder

Jochen Hetzler

Siebe Landheer

Gerald Richter

Maria Johanna Agnes Rubingh

Dieter Schmerek

Uwe Schubert

Willem Van Schaik

One aspect of the present invention relates to a mask inspection system for inspecting lithography masks, including a placement table for placing a lithography mask to be inspected, a first optical unit with a first beam path for examining structures of the lithography mask, and a second optical unit with a second beam path for establishing a position of at least one edge of the lithography mask. Here, the second beam path of the second optical unit passes at least once through a plane defined by the placement table.

Mask inspection system for inspecting lithography masks

In a system for flushing at least one internal space of an objective, in particular an exposure projection objective for semiconductor lithography, flushing is performed by mixing at least two inert gasses in such a way that the refractive index resulting therefrom corresponds at least approximately to the refractive index of air.

System for flushing at least one internal space of an objective

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Aalen, Germany

Joachim Schroeder