Institut Fuer Mikroelektronik Stuttgart

Institut Fur Mikroelektronik Stuttgart

Joachim N Burghartz

Wolfgang Appel

Martin Zimmermann

Heinz-Gerhard Graf

Christine Harendt

Muhammad Alshahed

Daniel Brosch

Mohammed Alomari

Franz Xaver Hutter

A semiconductor element includes an enhancement-type transistor structure with a layer construction including a base substrate, a first semiconductor layer, and a second semiconductor layer, which are arranged one on top of the other along a first direction. The transistor structure further has a source electrode, a gate electrode, and a drain electrode, which are spaced apart from one another along a second direction that is transverse to the first direction. The first and second semiconductor layers are formed by different group III nitride materials, such that a 2D electron gas forms in a boundary region of the first and second semiconductor layers. The first and second semiconductor layers have holes in the region of the gate electrode, between which holes multiple fins including the group III nitride materials remain. The gate electrode has a plurality of gate fingers extending into the holes.

Semiconductor element having an enhancement-type transistor structure

A semiconductor substrate having a first lateral dimension is combined with a flexible film piece having a second lateral dimension by arranging the semiconductor substrate in a recess of the film piece. The semiconductor substrate has circuit structures produced using lithography process steps. After the semiconductor substrate has been arranged in the recess of the film piece, a patterned layer of an electrically conductive material is produced above the semiconductor substrate and the film piece using lithography process steps. The patterned layer extends from the semiconductor substrate up to the flexible film piece and forms a number of electrically conductive contact tracks between the semiconductor substrate and the film piece.

Method for producing an integrated circuit and resulting film chip

In a method for producing a very thin chip including an integrated circuit, a circuit structure is produced in a defined section of a semiconductor wafer. The defined wafer section is subsequently released from the semiconductor wafer. For this purpose, the wafer section is firstly freed such that it is held only via local web-like connections on the remaining semiconductor wafer, which web-like connections are arranged at a lateral periphery of the wafer section. The web-like connections are subsequently severed.

Method for producing a thin chip comprising an integrated circuit

A circuit arrangement for generating light-dependent and temperature-dependent signals has a number of first and second sensor elements, which generate a number of first and second electrical signals. The first and second electrical signals depend on electromagnetic radiation impinging on the circuit arrangement. The first sensor elements are designed to generate the first electrical signals in a manner dependent on electromagnetic radiation from a first wavelength range which comprises a substantial part of the visible light. The second sensor elements are designed to generate the second electrical signals in a manner dependent on electromagnetic radiation from a second wavelength range which predominantly comprises infrared radiation. The first wavelength range overlaps the second wavelength range and it therefore also comprises infrared radiation.

Circuit arrangement and imaging pyrometer for generating light- and temperature-dependent signals

In a method for producing a thin film chip including an integrated circuit, a semi-conductor wafer having a first surface is provided. At least one cavity is produced under a defined section of the first surface by means of porous silicon. A circuit structure is produced in the defined section. The defined wafer section is subsequently released from the semiconductor wafer by severing local web-like connections, which hold the wafer section above the cavity and on the remaining semiconductor wafer.

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Leinfelden-Echterdingen, Germany

Joachim N Burghartz