Kabushiki Kaisha Toshiba

Jisaburo Ushizawa

Hitoshi Suzuki

Yasuo Ebata

Sadao Matsumura

A surface acoustic wave device has been developed, such as a surface acoustic wave filter in which a plurality of electroacoustic interdigital electrodes are formed, as thin films made principally of aluminum, on the surface of a Li.sub.2 B.sub.4 O.sub.7 single crystal substrate and a surface acoustic wave resonator, in which a plurality of electroacoustic interdigital electrodes and grating reflectors for reflecting the surface acoustic wave are formed, as thin films made principally of aluminum, on the surface of a Li.sub.2 B.sub.4 O.sub.7 single crystal substrate. Here, a cut angle, at which the substrate is cut from the Li.sub.2 B.sub.4 O.sub.7 single crystal, and the propagation direction of the surface acoustic wave are so set that, when the Eulerian angle representation is (90.degree..+-..lambda., 90.degree..+-..mu., 90.degree..+-..theta.), .lambda.=38.degree. to 52.degree., .mu.=0.degree. to 5.degree. and .theta.=0.degree. to 10.degree., whereby the TCD of the surface acoustic wave device is below .+-.5 ppm/.degree.C. and coupling coefficient K.sup.2 is about 1.0%, and the propagation speed suffers almost no angular dependence.

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Tokyo, Japan

Jisaburo Ushizawa