Minolta Camera Kabushiki Kaisha

Tokyo Electron Limited

Minolta Camera Co., Ltd.

Jiro Arima

Hiroji Tsujimura

Yoshihiro Okui

Tomonori Narita

Naoyo Takata

Hiroki Takebuchi

Toshiro Makino

A pyrometer includes a light source capable of emitting light to at least two wavelengths to a target to be measured. A light measuring member measures the light source and provides output signals representative of those two wavelengths. A second light measuring member measures light reflected by the target and provides second signals corresponding to the two wavelengths. A third light measuring member measures the intensity of the light radiated by the target with respect to those two wavelengths to produce third signals. An emissivity is assumed for the target based on the predetermined wavelengths, and a temperature is calculated on the basis of the minimum value of the difference between the assumed radiation intensity calculated according to the assumed emissivity of the target and the measured radiation intensity in accordance with the third signals.

Pyrometer

A measuring apparatus includes a flash tube for emitting flash light to a target in a first short period and a second short period, a detector for detecting amounts of light from the target in the flash light of the first short period and the flash light of the second short period, a receiver for receiving the flash light irrespective of the target to detect each reference light amount, an evaluator for evaluating the flash light according to the reference light amounts to generate a compensation signal for a characteristic of the flash light with respect to a characteristic of an ideal light source, and a calculator for calculating a characteristic value of the target under ideal light source according to the target light amount and the compensation signal.

Color measuring apparatus with flash lamp color temperature measurement

A method for measuring the surface temperature of a wafer substrate and a heat-treating apparatus are both used in a semiconductor device-manufacturing process wherein a reference light including infrared rays is intermittently emitted toward a wafer substrate. Infrared rays of a plurality of different types whose wavelengths are shorter than 1 .mu.m and differ from each other are selectively detected from the reference light emitted toward the wafer substrate, the reference light reflected by the wafer substrate, and the light radiated from the wafer substrate itself. On the basis of the detection performed with respect to the emitted reference light, the reflected reference light and the radiated infrared rays, the surface temperature of the wafer substrate is calculated. A substrate-heating element is controlled on the basis of the calculated temperature.

Method for measuring surface temperature of semiconductor wafer

A pyrometer according to the present invention calculates a temperature of a target to be measured by means of light emitting device for emitting reference light having three wavelengths to the target, and light measuring portions for measuring the intensity of the reference light, the intensity of light reflected by the target, the intensity of light transmitted through the target and the intensity of light radiated by the target, respectively with respect to each of the three wavelengths. The transmitted light measured value of the reference light transmitted through the target is used for temperature calculation in addition to the measured values of the reference light, the reflected light and the radiated light, and therefore even if the target is a semi-transparent object, the true temperature thereof can be calculated.

A photo-electric converter according to the present invention has a switching element connected between a photosensitive element and a photo-electric converting circuit and another switching element connected in parallel with the photosensitive element, and an output from the photo-electric converting circuit obtained by turning on and off the switching element is analogue-to-digital converted and arithmetically processed. Thereby an offset voltage in the photo-electric converter circuit can be corrected and an accurate output can be obtained by the photo-electric conversion.

Growing community of inventors

Osaka, Japan

Jiro Arima