Chinese Academy of Sciences

East China Normal University

Jintian Lin

Min Wang

Ya Cheng

Jianhao Zhang

Zhiwei Fang

Renhong Gao

Rongbo Wu

Jianglin Guan

A single-mode micro-laser based on a single whispering gallery mode optical microcavity and a preparation method thereof described includes: preparing a desired single whispering gallery mode optical microcavity doped with rare earth ions or containing a gain material such as quantum dots, wherein an optical microcavity configuration include a micro-disk cavity, a ring-shaped microcavity, and a racetrack-shaped microcavity; a material type include lithium niobate, silicon dioxide, silicon nitride, etc.; preparing an optical fiber cone or an optical waveguide of a required size which can excite high-order modes of the optical microcavity, such as a ridge waveguide and a circular waveguides; and coupling, integrating, and packaging the optical fiber cone or the optical waveguide with the microcavity. A pump light is coupled to the optical fiber cone or the optical waveguide to excite a compound mode with a polygonal configuration.

Single-mode micro-laser based on single whispering gallery mode optical microcavity and preparation method thereof

Method for preparing micro-optical structure on a film based on chemical mechanical polishing etching, combining photolithography technology with chemical mechanical polishing technology to make preparation and large-scale integration of large-size high-quality micro optical devices on-chip possible. The method comprises coating metal on film surface, selectively removing the metal film by photolithography (such as femtosecond laser selective ablation, ultraviolet photolithography, electron beam etching, ion beam etching, and reactive ion etching), chemical mechanical polishing, chemical corrosion or over polishing and other steps. Micro-optical devices on-chip prepared by the method have extremely high surface finish and extremely low optical loss. The method is applicable to preparing high-quality micro-optical structures (including but not limited to microdisc cavities, microring cavities, optical waveguides and coupled devices thereof) on various films on-chip (including but not limited to lithium niobate single crystal films, quartz films, silicon films, silicon dioxide films, diamond thin films, etc.).

Method for preparing film micro-optical structure based on photolithography and chemomechanical polishing

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Shanghai, China

Jintian Lin