Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Samsung Displayco., Ltd.

Jinseock Kim

Jonghee Park

Kitae Kim

Yu-Gwang Jeong

Taesung Kim

Sang Gab Kim

Hyunmin Cho

Dae-Woo Lee

Hyun-Cheol Shin

Subin Bae

Sang-Hyuk Lee

Gyu-Po Kim

Wonwoo Choi

Youngdae Kim

Changok Kim

Inbae Kim

Hyuntae Kim

Beomsoo Kim

In-bae Kim

Youngjin Yoon

Giyong Nam

Daesung Lim

Kyungbo Shim

Donghun Nam

Sangtae Kim

Zheng Hong

A display device includes a display panel configured to display an image, the display panel including a first non-folding area; a second non-folding area; and a folding area disposed between the first non-folding area and the second non-folding area; and a window disposed on the display panel and including a folding portion overlapping the folding area of the display panel. The folding portion of the window includes a first substantially curved surface, a substantially flat surface extending from the first substantially curved surface; and a second substantially curved surface extending from the substantially flat surface.

Display device, method of manufacturing window, and method of manufacturing display device

A display apparatus includes a substrate, a first insulating layer on the substrate, first metal layers on the first insulating layer and having a compressive stress or a tensile stress of about 100 megapascals (MPa) or less, and a second insulating layer including a first layer covering the first metal layers and a second layer including a material different from a material of the first layer.

Display apparatus

An etchant composition includes an inorganic acid compound of about 8 wt % to about 15 wt %, a sulfonic acid compound of about 2.5 wt % to about 8 wt %, a sulfate compound of about 6 wt % to about 14 wt %, an organic acid compound of about 40 wt % to about 55 wt %, a metal or metal salt of about 0.01 wt % to about 0.06 wt %, and water.

Etchant composition and method of manufacturing display apparatus by using the same

A method of manufacturing a display substrate may include the following steps: forming a drain electrode on a pixel area of a substrate; forming a pad electrode on a pad area of the substrate; forming an inorganic insulation layer that covers the drain electrode and the pad electrode; forming an organic insulation member that has a first thickness at the pixel area of the substrate, has a second thickness less than the first thickness at the pad area of the substrate, exposes a first portion of the inorganic insulation layer on the drain electrode, and exposes a second portion of the inorganic insulation layer on the pad electrode; removing the first portion of the inorganic insulation layer and the second portion of the inorganic insulation layer; and partially removing the organic insulation member.

Display substrate, method of manufacturing display substrate, and display device including display substrate

A substrate processing apparatus includes a first process chamber in which a target substrate is processed, a first tank connected to the first process chamber to supply a first chemical to the first process chamber, a second process chamber in which the target substrate is processed, and a second tank connected to the second process chamber to supply a second chemical to the second process chamber. A metal ion contained in the first chemical supplied to the first process chamber has an ion concentration greater than an ion concentration of the metal ion contained in the second chemical supplied to the second process chamber.

Substrate processing apparatus and method of manufacturing display panel using the same

An etching composition for a silver-containing thin film includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a metal-based oxidizer, and water.

Etching composition for thin film containing silver, method for forming pattern and method for manufacturing a display device using the same

An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.

Etching composition, method for forming pattern and method for manufacturing a display device using the same

An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.

Etchant and method of manufacturing display device by using the same

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Yongin-si, South Korea

Jinseock Kim