Samsung Electronics Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Jinkyu Roh

Hoon Hee Han

Hyosan Lee

Jungmin Oh

Changsu Jeon

Hyojoong Yoon

Dongwun Shin

A silicon layer etchant composition and associated methods, the composition including about 1 wt % to about 20 wt % of an alkylammonium hydroxide; about 1 wt % to about 30 wt % of an amine compound; about 0.01 wt % to about 0.2 wt % of a nonionic surfactant including both a hydrophobic group and a hydrophilic group; and water, all wt % being based on a total weight of the silicon layer etchant composition.

Silicon layer etchant composition and method of forming pattern by using the same

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Seoul, South Korea

Jinkyu Roh