Samsung Display Co., Ltd.

Samsung Sdi Co., Inc.

Dongwoo Fine-Chem Co., Ltd.

Jinhyung Kim

Youngmin Kim

Jonghee Park

Hyoung Sik Kim

Donghun Lee

Gi-Yong Nam

Suck Jun Lee

Dongmin Jang

Kyungchan Min

O Byoung Kwon

Minsoo Kim

Sunghwan Kim

Changsoo Kim

Sunmin Hwang

Kyu-Hun Lim

Jaeyeol Baek

Hyunji Song

Seulgi Jeong

Younhee Nam

Byeri Yoon

Yoona Kim

Daesung Lim

Giyong Nam

Youngchul Park

Chungheon Lee

Sunhae Kang

Sangtae Kim

Seunghee Hong

Kyungbo Shim

Jinsook Kim

Sanghoon Jang

Haccheol Kim

Kyu-hun Lim

Byungsu Lee

Jungseek Jung

Dongki Kim

Joohwan Chung

An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.

Etching composition for thin film containing silver, method for forming pattern and method for manufacturing a display device using the same

A thin film etchant composition for preventing re-adsorption of an etched metal and uniformly etching a thin film is provided. The thin film etchant composition includes about 43 wt % to about 46 wt % of phosphoric acid, about 5 wt % to about 8 wt % of nitric acid, about 10 wt % to about 17 wt % of acetic acid, about 1 wt % to about 3 wt % of iron nitrate, about 0.7 wt % to about 1.5 wt % of phosphate, and deionized water as a remaining amount based on a total weight of the thin film etchant composition.

Thin film etchant composition and method of forming metal pattern by using the same

A method of producing a layer structure and a method of forming a pattern, the method of producing a layer structure including coating a first composition on a substrate that has a pattern thereon; curing the coated first composition to form a first organic layer; applying a liquid material to the first organic layer to remove a part of the first organic layer; and coating a second composition on remaining parts of the first organic layer; and curing the coated second composition on the remaining parts of the first organic layer to form a second organic layer: wherein the first composition and the second composition each independently include a solvent, and a polymer including a structural unit represented by Chemical Formula 1,*A-B*.&#x2003;&#x2003;[Chemical Formula 1]

Method of producing layer structure, and method of forming patterns

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Yongin-si, South Korea

Jinhyung Kim