Asml Netherlands B.v.

Asml Holding N.v.

Jinggao Li

Frank Johannes Jacobus Van Boxtel

Jeroen Gerard Gosen

Bart Dinand Paarhuis

Herman Vogel

Antonius Johannus Van Der Net

An apparatus, in an embodiment, having a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element, wherein the first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces, and wherein the projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to the flow, that is lower against flow that is parallel to the certain direction than against flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct gas flow onto a driver part that generates heat.

Lithographic apparatus and device manufacturing method

A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.

Lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus

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Fairfield, CT, United States of America

Jinggao Li