Beijing Naura Microelectronics Equipment Co., Ltd.

Jingfeng Wei

Qing She

Lei Zhu

Mengxin Zhao

Hong Ji

Jue Hou

Keke Zhao

The present disclosure discloses a semiconductor processing apparatus, which is configured to perform processing on a wafer. The disclosed semiconductor processing apparatus includes a vacuum interlock chamber, a plurality of apparatus bodies, the apparatus body including a transfer platform, and at least two reaction chambers being arranged along a circumferential direction of the transfer platform, and a temporary storage channel, any two neighboring apparatus bodies being communicated through the temporary storage channel, and the temporary storage channel being configured to temporarily store the wafer. One of the plurality apparatus bodies is connected to the vacuum interlock chamber. The transfer platform is configured to transfer the wafer between the vacuum interlock chamber and the reaction chamber, between the temporary storage channel and the vacuum interlock chamber, and between the temporary storage channel and the reaction chamber. With the above solution, the problem that the productivity of the semiconductor processing apparatus is low is solved.

Semiconductor processing apparatus

A mixing inlet device of semiconductor processing equipment is arranged at a top of a process chamber of the semiconductor processing equipment and configured to input a process gas into the process chamber. The mixing inlet device includes a cover assembly and a mixing inlet block. A bottom of the cover assembly covers the top of the process chamber. The mixing channel is arranged in the cover assembly. The mixing inlet block is arranged at a center position at a top of the cover assembly and includes a plurality of inlet channels and a first annular chamber. A top of the first annular chamber communicates with the plurality of inlet channels, and a bottom of the first annular chamber communicates with the mixing channel of the cover assembly.

Semiconductor processing apparatus and mixing inlet device

A magnetron drive mechanism is provided. The magnetron drive mechanism includes: a driving assembly, a rotating assembly, a transmission assembly, and a limiting assembly. The driving assembly is configured to drive the rotating assembly and the transmission assembly to rotate clockwise or counterclockwise around a first rotation axis. The rotating assembly is connected to a magnetron, and through the transmission assembly, the driving assembly drives the rotating assembly and the magnetron to rotate clockwise or counterclockwise around a second rotation axis. The second rotation axis and the first rotation axis are parallel with each other. The limiting assembly is configured to block the rotating assembly from rotating clockwise or counterclockwise, respectively, to confine the magnetron to positions at different radii of the first rotation axis. The present disclosure also provides a magnetron assembly and a reaction chamber.

Growing community of inventors

Beijing, China

Jingfeng Wei