International Business Machines Corporation

Shanghai Huali Microelectronics Corporation

Spreadtrum Communications (shanghai) Co., Ltd.

Shanghai Jiaotong University

Shanghai Huali Integrated Circuit Corporation

Jin Xa Xu

Yu Ren

Minjie Chen

Yukun Lv

Zaifeng Tang

Yi He

Mark Sean Fleming

Xianliang Chen

Xichun Gao

Jinjin Ni

Jia Zhong Wu

Zhi Qiang Wei

Guojie Li

Yiguo Zhao

Zhe Zhu

Juan Wu

Keyou Wang

Pan Wu

Liu Chong

Xusheng Zhang

Yutai Hao

Steven E McNeal

Gregory Carson Windsor

Chen Tang

Zirun Li

Jian Ding

Qiyan Feng

Quan Jing

Kaiqu Ang

A terminal device includes: a PHY decoding accelerator, a downlink data processing accelerator and a CP; where the PHY decoding accelerator is configured to decode and CRC check received downlink data, and send a correctly decoded transport block (TB) to the downlink data processing accelerator; the downlink data processing accelerator performs processing operations of a MAC layer, a RLC layer, and a PDCP layer on the TB to obtain an MAC CE, an RLC control PDU, an RLC TMD PDU, a PDCP control PDU and a PDCP data SDU, and outputs to the CP; and the CP processes the MAC CE, the RLC control PDU, the RLC TMD PDU, the PDCP control PDU and the PDCP data SDU.

Terminal device based on downlink data processing accelerator

Electromagnetic transient simulation method applicable to a field programmable gate array (FPGA), which integrates topological parameters of a circuit to be simulated into two matrix parameters in an initialization stage thereof; and voltage and current information at each simulation moment can be obtained only through simple matrix multiplication operation in a main part of the simulation cycle thereof. The method avoids complex initialization operation in the field programmable logic array; meanwhile, the flow of the main part of the simulation cycle in the FPGA is maximally compressed, and the efficiency of electromagnetic transient simulation based on the FPGA is greatly improved.

Electromagnetic transient simulation method for field programmable logic array

The present application relates to a wafer transfer module in a semiconductor manufacturing machine, relating to semiconductor integrated circuit manufacturing machines, wherein two sets of transmitter/receivers are provide on sidewalls of the wafer transfer module to monitor the travel position of an elevator, two sets of transmitter/receivers are provide on the sidewalls of the wafer transfer module to monitor the position of a transfer arm, a signal received by the receiver is transmitted to a control system such that the control system determines, according to the travel position of the elevator and the transfer arm position, whether the transfer arm can obtain a to-be-transferred wafer, thereby preventing the problem of a wafer scratch caused by an elevator position deviation or a transfer arm position deviation.

Wafer transfer module and method thereof for transferring to-be-transferred wafer

The present application discloses a preventive maintenance method for a chamber of a metal etching machine. An optimized burning cleaning recipe is added before the chamber is opened, and metal substances remaining on the surface of an electrostatic chuck are removed by adopting a cleaning/pumping down multi-step alternate method. Before the chamber is opened for preventive maintenance, the phenomenon of metal particles remaining on the surface of the electrostatic chuck can be significantly improved, thus solving the downtime problem caused by abnormal backside helium and ensuring the stability of mass production.

Preventive maintenance method for chamber of metal etching machine

A hybrid electromagnetic transient simulation method for microgrid real-time simulation, wherein a traditional node analysis method (NAM) and a highly parallel latency insertion method (LIM) are combined, so that the microgrid is firstly divided from a filter of a distributed power generation system to form one latency insertion method (LIM) network containing a power distribution line and a plurality of node analysis method (NAM) networks containing the distributed power generation system respectively, the NAM network being simulated by traditional node analysis method, the LIM network being simulated by the latency insertion method, in an initialization stage, one correlation matrix and four diagonal matrixes containing line parameters used for LIM network simulation being formed according to line topology and parameters of the microgrid, in a main cycle of the simulation, the LIM network solved simultaneously with multiple NAM networks, a parallelism of a microgrid simulation being improved.

Hybrid electromagnetic transient simulation method for microgrid real-time simulation

A movement platform connected to a virtual reality system may have a plurality of movement units. A movement unit may have a sphere with one or more motors and one or more sensors. The one or more motors may rotate the sphere to move a user. The one or more sensors may detect movement or force from the user.

VR movement platform

In some embodiments, a movement platform may be used to develop force models for the determination of movement based on force patterns received from the movement platform. A force model is made by comparing a known user movement to force readings recorded during the user movement. Movement platform force readings may be compared to a plurality of force models to determine a user movement. Once a matching force model is determined, the matching force model may be used to generate instructions for moving a user on the movement platform.

A multi-card user equipment and a method for processing its service are provided. The method includes, when receiving service request corresponding to a first subscriber identity card, implementing data transmission channel between user equipments and a network which is corresponding to the first subscriber identity card to process the service request; the data transmission channel corresponding to at least two of the subscriber identity cards shares a common wireless connection. With the method, providing services for multiple cards at the same time can be available, meanwhile hardware cost and complexity is decreased, and wireless transmission resources is saved.

Multi-card user equipment and service processing method thereof

A multi-card user equipment, and service processing method and device thereof are provided. The method includes, when receiving a service request, detecting whether a data transmission channel has been established with a network, wherein a number of the established data transmission channels is less than a number of the subscriber identity cards in the multi-card user equipment; and processing a service corresponding to the service request by using the established data transmission channel. With the method, multiple cards can be provided service at the same time, while hardware cost and complexity is decreased and wireless transmission resources is saved.

Multi-card user equipment and service processing method and device thereof

The invention disclosed a method for forming shallow trenches of the dual active regions. Firstly, forming an etch stop layer on a semiconductor substrate; secondly, using a first accurate photomask to expose and develop the semiconductor substrate, until the etch stop layer has been exposed on the top of the first shallow trench regions and the second shallow trench regions; thirdly, etching the etch stop layer entirely in the exposed regions; fourthly, using a second photomask to expose and develop the first shallow trench regions which require a deeper etch depth of the trench than that of the second shallow trench regions; fifthly, etching and forming preliminary entirely depth in the first shallow trench regions, and then removing the second photomask; at last, taking the etch stop layer as a mask, and simultaneously etching the first shallow trench regions and the second shallow trench regions to form the first hallow trenches and the second shallow trenches having different depths. The invention has realized a low-cost photomask application and an optimization of the etching process by optimizing the photomask design.

Method for forming shallow trenches of the dual active regions

A method of etching a shallow trench is disclosed in the present invention. By removing the photoresist layer immediately at the end point of the hard mask layer etching and further using the improved process conditions etch the top of the substrate at the same time of the hard mask layer over-etching, such as a lower bias power, a higher pressure and a bigger polymer gases flow rate, the present invention has formed a smooth morphology on the top of the shallow trench. Therefore, the sharp corner appeared in the prior art is avoided by changing the start point of the silicon substrate etching, so as to fundamentally eliminate the leakage current caused by the sharp corner.

Method of etching a shallow trench

A computer implemented method of storing data in at least one mobile node according to mobile node location may include identifying a first qualified mobile node and determining a first geographic position of the first qualified mobile node. The method may include determining a user geographic position of a user device, determining whether the first geographic position is within a first proximity relative to the user device, and causing storage of a first data portion in the first qualified mobile node in response to determining that the first geographic position is within the first proximity.

Dynamic proximity based networked storage

The present invention provides a method for controlling a critical dimension of shallow trench isolations in a STI etch process, comprises the following steps: before the STI etch process, pre-establishing a mapping relation between a post-etch and pre-etch critical dimension difference of a BARC layer and a thickness of the BARC layer; and during the STI etch process after coating the BARC layer, measuring the thickness of the BARC layer and determining a trimming time for a hard mask layer according to a critical dimension difference corresponding to the measured thickness in the mapping relation and a critical dimension of a photoresist pattern, then performing a trimming process for the hard mask layer lasting the trimming time to make a critical dimension of the hard mask layer equal to a required critical dimension of an active area, and etching a substrate to form shallow trenches with a predetermined critical dimension.

Growing community of inventors

Xi'an, China

Jin Xa Xu