Saint-gobain Glass France

Jin Woo Han

Young Seong Lee

Eui Jin Shin

Ji Woong Baek

Eun Hack Jang

A transparent substrate provided with a multi-layered coating is provided, the coating including the following in an order from the substrate: a first dielectric film including one or more dielectric layers, a first metallic protective layer, a first metallic layer having an infrared (IR) reflection characteristic, a second metallic protective layer, a second dielectric film including two or more dielectric layers, a third metallic protective layer, a second metallic layer having an infrared (IR) reflection characteristic, a fourth metallic protective layer, and a third dielectric film Dincluding one or more dielectric layers, wherein the dielectric layer includes a metal oxide, a metal nitride, or a metal oxynitride, the metallic layer is silver (Ag) or a silver (Ag)-containing metal alloy, a normal emissivity is 2.0% or less, and a difference between a coated surface reflectance and an uncoated surface reflectance is 21% or more.

Transparent substrate provided with multi-layered coating and insulation glazing unit including the same

A method for preparing a laminate substrate for a light emitting device, includes (a) providing a glass substrate having a refraction index of between 1.45 and 1.65, (b) coating a metal oxide layer onto one side of the glass substrate, (c) coating a glass frit having a refractive index of at least 1.7 onto the metal oxide layer, the glass frit including at least 30 weight % of BiO, (d) firing the thus coated glass substrate at a temperature comprised between 530&#xb0; C. and 620&#xb0; C. thereby making react the metal oxide with the melting glass frit and forming a high index enamel layer with a plurality of spherical voids embedded in the lower section of the enamel layer near the interface with the glass substrate.

Transparent diffusive OLED substrate and method for producing such a substrate

A method for preparing a laminate substrate for a light emitting device includes providing a glass substrate having a refraction index, at 550 nm, of between 1.45 and 1.65, coating a glass frit having a refractive index, at 550 nm, of at least 1.7 onto the glass substrate, firing the resulting frit coated glass substrate at a temperature above the Littleton temperature of the glass frit thereby forming a first high index enamel layer, coating a metal oxide layer onto the first high index enamel layer, and firing the resulting coated glass substrate at a temperature above the Littleton temperature of the glass frit, thereby making react the metal oxide with the underlying first high index enamel layer and forming a second high index enamel layer with a plurality of spherical voids embedded in the upper section of the second high index enamel layer near the interface with air.

A layered structure for an organic light-emitting diode (OLED) device, the layered structure including a light-transmissive substrate and an internal extraction layer formed on one side of the light-transmissive substrate, in which the internal extraction layer includes (1) a scattering area containing scattering elements composed of solid particles and pores, the solid particles having a density that decreases as it goes away from the interface with the light-transmissive substrate, and the pores having a density that increases as it goes away from the interface with the light-transmissive substrate, and (2) a free area where no scattering elements are present, formed from the surface of the internal extraction layer, which is opposite to the interface, to a predetermined depth.

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Seoul, South Korea

Jin Woo Han