Korea Advanced Institute of Science and Technology

Kisco

Jin-Wan Jeon

Jun-Bo Yoon

Koeng Su Lim

Dae-Hyun Kim

Min-Woo Kim

Disclosed is a method for manufacturing a photovoltaic device. The method for manufacturing a photovoltaic device includes providing substrates having trenches formed therein, forming a first electrode layer, and forming an auxiliary electrode layer in areas between the trenches such that the auxiliary electrode layer is located on or under the first electrode layer, the auxiliary electrode layer having electrical resistance less than that of the first electrode layer, and contacting with a portion of an area of the first electrode layer, forming a photovoltaic layer on the first electrode layer or the auxiliary electrode layer, forming a second electrode layer by obliquely depositing a second conductive material on the photovoltaic layer, etching the photovoltaic layer formed in the trenches such that the first electrode layer or the auxiliary electrode layer are exposed and forming a conductive layer by obliquely depositing a third conductive material on the second electrode layer such that the second electrode layer and either the first electrode layer or the auxiliary electrode layer are electrically connected to each other within the trench, the first electrode layer or the auxiliary electrode layer formed in one area generating electricity from light, and the second electrode layer formed in another area generating electricity from light.

Photovoltaic device and method for manufacturing thereof

Disclosed are a micro mirror and a micro mirror array using the same. The micro mirror includes: an insulation substrate; an address electrode formed on the insulation substrate; a charging unit electrically insulated from the address electrode; and a reflecting body rotatably provided on the insulation to reflect incident light and spaced apart from the address electrode and the charging unit.

Micro-mirror and micro-mirror array using the same

The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film. A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.

Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same

A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.

Polymer or resist pattern, and metal film pattern, metal pattern and plastic mold using the same, and fabrication methods thereof

Disclosed are a micromirror device made in a simple structure using interdigitated cantilevers and having two stable rotational states, and applications thereof. The micromirror device comprises: (a) a substrate; (b) at least two protruded support posts arranged protrudedly in two columns of left and right sides on the substrate and apart by a predetermined interval from each other; (c) multiple cantilevers formed in parallel with the substrate, each having one end attached at the upper end portion of the respective protruded support posts and made in a thin strip having an elastic restoring force, wherein the cantilevers adjacent to each other are arranged to be parallel and interdigitated; (d) mirror support posts coupled to upper portions of the other ends of the cantilevers; (e) a mirror attached on upper portions of the whole mirror support posts and supported by the mirror support posts; and (f) two electrodes formed at left and right sides on the substrate, for providing an electrostatic force to the mirror, wherein the micromirror device reflects light incident into the mirror in different directions from each other by using an electrostatic force due to a voltage applied between the electrodes and the mirror, and the elastic restoring force of the cantilevers. The micromirror device can drive the mirror in two directions and adjust a rotational angle of the mirror using the electrostatic force due to a potential difference between the electrodes and the mirror for reflecting incident light, and the elastic restoring force of the cantilevers.

Growing community of inventors

Daejeon, South Korea

Jin-Wan Jeon