Hitachi, Ltd.

Other

Hitachi Haramachi Electronics Co., Ltd.

Jin Onuki

Masahiro Koizumi

Yasushi Koubuchi

Masayasu Nihei

Ryuichi Saito

Kazuji Yamada

Kazuhiro Suzuki

Kunio Miyazaki

Masateru Suwa

Isao Kobayashi

Yasutoshi Kurihara

Tatsuo Itagaki

Akira Tanaka

Nobuya Koike

Yoshihiko Koike

Mamoru Sawahata

Yutaka Higashimura

Tadao Kushima

Takashi Haramaki

Shigeki Sekine

Takashi Hosokawa

Hideo Shimizu

Hideya Kokubun

Mutsuhiro Mori

Shinichi Fukada

Ko Soeno

Hisakichi Onodera

Hiroyuki Ozawa

Satoshi Shimada

Toshiaki Morita

Takahiro Nagano

Tsutomu Yatsuo

Shin Kimura

Jun Sugiura

Naohiro Momma

Hitoshi Suzuki

Keiichi Kuniya

Ryo Hiraga

Hirokazu Inoue

Takao Funamoto

Yasumichi Yasuda

Yoshiteru Shimizu

Susumu Okikawa

Osamu Asai

Masayoshi Naito

Akio Chiba

Tomio Iizuka

Fumio Sato

Akira Onuma

Takeo Tamamura

Keiichi Morita

Seiki Shimizu

Tomio Yasuda

Katsuhiko Shiota

Katsumi Suzuki

Mitsuo Yanagi

Izumi Sakurai

Motoo Suwa

Hisakithi Onodera

Yukio Kamita

Makoto Nakajima

Yoshio Ohashi

Toshio Chuma

Kazuo Hatori

Isao Araki

Katuhiko Shiota

Genji Taki

A semiconductor device in which electrodes of a plurality of semiconductor elements are bonded onto at least one of a plurality of electrode patterns on an insulator substrate, the other surface of the insulator substrate being bonded to a heat dissipating base. The upper surface of the heat dissipating base is covered with a member for cutting off the semiconductor elements from the outer environment. Terminals electrically connect the electrodes on said insulator substrate and the electrode placed outside the cutoff member. The material of the heat dissipating base has a linear expanding coefficient larger than that of the semiconductor element and smaller than three times that of the semiconductor element, and a thermal conductivity larger than 100 W/mK. The semiconductor elements are arranged on at least one electrode surface and in at least two regions divided by the other electrode surface on the insulator substrate.

Circuit board

A semiconductor device in which a plurality of semiconductor elements are bonded onto at least one electrode pattern on an insulator substrate formed a plurality of electrode patterns on the main surface, each of the electrodes of the semiconductor element being electrically connected to the electrode pattern, the other surface of the insulator substrate being bonded to a heat dissipating base, the upper surface of the heat dissipating base being covered with a member for cutting off the semiconductor elements from the outer environment, terminals electrically connecting the electrodes on said insulator substrate and the electrode placed outside the cutoff member being provided, wherein the material of the heat dissipating base has a linear expanding coefficient larger than the linear expansion coefficient of the semiconductor element and smaller than three times of the linear expansion coefficient of the semiconductor element, and a thermal conductivity larger than 100 W/mK, the semiconductor elements being arranged on at least one electrode surface and in at least two regions divided by the other electrode surface on the insulator substrate.

Semiconductor device

A semiconductor module has a plurality of power semiconductor devices mounted on a substrate, and a metal foil for wiring is mounted on the substrate so that an asymmetric unit arrangement of the semiconductor devices is formed. In the device, all of the units are arranged in the same direction on the substrate, and all of the units are electrically connected with electrode terminal feet, and the electrode terminal feet are electrically connected with linkage terminal foot. The electrode terminal feet are disposed with a certain interval.

Semiconductor module

In a method for high frequency pulse welding and an apparatus therefor, a highly directive arc can be obtained by eliminating the effect of the inductance of the welding cable, which tends to make the high frequency electromagnetic pinch force large. In a method and an apparatus for high frequency pulse arc welding which is performed by generating an arc between an inconsumable electrode or a consumable electrode arranged near a portion of a base metal to be welded and the base metal with main pulse current, when the main pulse current is shifted from ON to OFF, a reverse pulse current having a polarity opposite to the polarity of the main pulse is supplied between the electrode and the base metal to improve the stiffness (directivity) of the arc by making the rising and falling edges of the pulses steeper. A rail-car and a nuclear power plant obtained by the method are also provided.

Method of high frequency pulse arc welding and apparatus therefor

Semiconductor device having power semiconductor elements

A method of solder bonding suitable for a body having a large bonding surface area including the following steps of cleaning off the bonding surfaces in vacuum chamber by impinging accelerated particles such as argon ions through reverse spattering; then covering with an oxidation inhibiting thin silver film over the cleaned off bonding surfaces through spattering; further sandwiching a cleaned off solder foil between the bonding surfaces covered with the oxidation inhibiting thin sliver film; and heating the solder foil in vacuum upto the melting temperature thereof to complete the bonding, whereby defects in the solder bonding is reduced downto about 1/25 and life time of the solder bonding which is affected by thermal fatigue is prolonged twice in comparison with a conventional solder bonding method, thereby reliability of the solder bonding is greatly improved.

Method of solder bonding and power semiconductor device manufactured by

A first power semiconductor device with a semiconductor base to which an emitter wire electrode is connected through an emitter bonding pad and a gate wire electrode is connected through a gate bonding pad, wherein the gate bonding pad comprises a silicon oxide film, a silicon crystal layer and a gate wiring electrode made of aluminum containing silicon which are successively formed on the semiconductor base, and the gate wire electrode is connected to the gate wiring electrode. A second power semiconductor device wherein the emitter bonding pad is an emitter wiring electrode made of aluminum containing silicon which is directly formed on the semiconductor base, and the emitter wire electrode is bonded to the emitter wiring electrode.

Power semiconductor device

A thin film forming method and apparatus, wherein a negative voltage is applied alternately to a target and a substrate to perform film formation and reverse sputter alternately. Further, a coil is mounted between the target and the substrate and a high frequency current is made to flow therethrough to generate plasma. A negative base voltage smaller in absolute value than that during sputter may be applied to the substrate to make Ar ions flow into the substrate while it is subjected to reverse sputter. Thus, a film whose step coverage is 0.3 or more is possible. It becomes also possible to maintain a stable discharge and perform reverse sputter in a high vacuum region. The pressure of an Ar atmosphere may be lowered to 10.sup.-3 Torr or less. An aluminum wiring film whose peak value of x-ray diffraction strength at a (111) plane is 150 Kcps or more is possible. Also, a barrier layer having a layered structure of granular and columnar crystals or a mixed structure thereof providing an efficient barrier effect and a large specific resistance is possible.

Method of and apparatus for sputtering, and integrated circuit device

A resin encapsulated semiconductor device comprises a semiconductor element, a conductive base, a wire of aluminum connecting the element and the base, and a thermosetting resin encapsulating hermetically the component to protect the device from a mechanical stress and ambient atmosphere.

Semiconductor device using annealed bonding wire

A semiconductor device having a high reliability wiring conductor structure applicable to DRAMs and SRAMs. The semiconductor device of the present invention is characterized by comprising a first wiring conductor film wherein a specific resistance is 5.about.15.mu..OMEGA.cm and an allowable current density is 1.times.10.sup.6 .about.1.times.10.sup.8 A/cm.sup.2 ; a second wiring conductor film having a laminated layer structure formed of a layer of high fusing point and low resistance material and a layer of an Al based alloy; and a plug composed of a high fusing point and low resistance material, electrically connecting to the first wiring conductor film and the second wiring conductor film. Thus, a semiconductor device showing almost no increase in electrical resistance in a wiring conductor film due to electromigration even after subjecting to a large current is provided.

Semiconductor device and method for manufacturing the same

A semiconductor device and the method of fabricating the semiconductor device include a semiconductor substrate and a plurality of conductor films formed on the substrate. Each of the conductor films is made of aluminum alloy including at least one element selected from palladium and platinum and, more preferably, further including at least one element selected from lithium, beryllium, magnesium, manganese, iron, cobalt, nickel, copper, lanthanum, cerium, chromium hafnium, zirconium, cadmium, titanium, tungsten, vanadium, tantalum, and niobium, with a protective film which includes oxide of the selected one of palladium and platinum being formed on the side wall of the conductor film.

Semiconductor device and method of fabricating the same

A thin film forming method and apparatus is provided, wherein a negative voltage is applied alternately to a target and a substrate to perform film formation and reverse sputter alternately. Further, a coil is mounted between the target and the substrate and a high frequency current is made to flow therethrough to generate plasma. A negative base voltage smaller in absolute value than that during sputter may be applied to the substrate to make a fraction of Ar ions to flow into the substrate while it is subjected to reverse sputter. Thus, a film whose step coverage is 0.3 or more is possible. It becomes also possible to hold stable discharge and reverse sputter at a high vacuum region. The pressure of an Ar atmosphere may be lowered to 10.sup.-3 Torr or less. A film whose peak value of x-ray diffraction strength in the (111) plane is 150 Xcps or more is possible. Also, a barrier layer with a layered structure of granular and columnar crystals or a mixed structure thereof and hence with an efficient barrier effect and a large specific resistance is possible.

Method of and apparatus for sputtering

The present invention concerns a semiconductor device and a process for producing semiconductor device, as well as a wire bonding device used therefor. In accordance with the present invention, a ball formed at the top end of a bonding wire is sphericalized by electric discharge within a reducing gas atmosphere at a high temperature from 100.degree. C. to 200.degree. C. By using the ball of the bonding wire formed under such a condition to the bonding of the bonding pad of a semiconductor pellet, it is possible to conduct highly reliable ball bonding with excellent bondability and with no development of cracks or the like in the semiconductor pellet, as well as to obtain a highly reliable semiconductor device, that is, LSI or IC.

Semiconductor device and production process thereof, as well as wire

This invention provides a semiconductor device having an electrode conductor layer on a semiconductor substrate through the medium of a diffusion barrier layer, comprising the diffusion barrier layer formed of an amorphous material having a higher crystallization temperature than the heat treatment temperature for the semiconductor device. According to this invention, the reaction between the metal conductor and the semiconductor substrate and the diffusion of the conductor material into the semiconductor substrate can be prevented and resultantly a semiconductor device having a high thermal reliability can be obtained.

A corrosion-resistant aluminum electronic material comprising an alloy containing aluminum as the principal component and, in addition, a small amount of a noble metal, the content of said noble metal being equal to or less than that at the eutectic point having the primary crystal of aluminum. As the noble metal, there is contained at least one metal selected from Pt, Pd, Rh, Ir, Os, Ru, Au and Ag. Said electronic material is used for ball-bonding wire and distributing film in a semiconductor device, and the like.

Corrosion-resistant aluminum electronic material

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Hitachi, Japan

Jin Onuki