Samsung Electronics Co., Ltd.

Korea Advanced Institute of Science and Technology

Chong Kun Dang Pharmaceutical Corporation

Jin Hyeock Choi

Jong Ho Bang

Byung Chang Kang

Byung Moo Lee

Nam Jeong Lee

In-kyun Shin

Jin-Ha Jeong

Inkyun Shin

Shuichi Tamamushi

Hea-Yun Lee

Sangho Park

Sang-hee Lee

Byung-Gook Kim

Sang-Hee Lee

Sung Ho Seo

Jung Pil Lee

Kyung Phil Yoo

Hee-Bom Kim

Myung Sub Shin

Jin Kyu Kang

Joon Hyuk Kang

Gwiho Lee

Jung Taek Oh

Hee Jin Jang

Rae-won Yi

Urazaev Vladimir

Sukjong Bae

Sook Hyun Lee

Heung-suk Oh

Sin-jeung Park

Yuntae Kim

Sung-Ho Lee

Jaeyoung Lee

Jong-Hyuk Kang

Chang Sik Lee

Wooyoung Choi

Young Gu Kang

Vladimir Urazaev

Yong-Jun Park

June Koo Rhee

Hwa Seok Oh

Hyeseung Song

Ho-Dong Jwa

Yong-Seok Jung

Hakjoo Kim

Sunghoon Park

Jong-Cheul Park

Young-Gyu Kang

Byoung-Sup Ahn

Yong-Ho Yoo

Jun Hyuk Kim

Jong-su Kim

Kyungryol Lee

Hyun-Joo Cha

Hee-Dong Park

Tae-Jung Park

Jeonghyeon Lee

So-eun Shin

Seong Sik Hwang

Sung-il Lee

Sinjeung Park

Seombeom Kim

In-Hwan Noh

Byeong-Cheol Gil

Dae-Hui Kim

Young Don Chung

A method and a device for determining transmission power in a multi-antenna communication system are provided. The method for determining transmission power includes calculating the power consumption of a transmission device, calculating the capacity of the transmission device, and determining transmission power for maximizing the energy efficiency of the transmission device by using the power consumption and the capacity thereof.

Method and device for determining transmission power in multi-antenna communication system

An electronic device and a method for sharing content information are provided. An operation method of the electronic device includes displaying a content on a display of the electronic device, selecting at least a part of the area of the display, and transmitting to an external device, a part of the content displayed in a part of the area of the display such that the transmitted content is controlled through a display of the external device independently of the content displayed on the display. Other embodiments are also disclosed.

Method for providing content information and electronic device therefor

The present disclosure relates to novel compounds having histone deacetylase 6 (HDAC6) inhibitory activity, stereoisomers thereof or pharmaceutically acceptable salts thereof, the use thereof for the preparation of therapeutic medicaments, pharmaceutical compositions containing the same, a method for treating diseases using the composition, and methods for preparing the novel compounds. The novel compounds, stereoisomers thereof or pharmaceutically acceptable salts thereof according to the present disclosure have histone deacetylase (HDAC) inhibitory activity and are effective for the prevention or treatment of HDAC6-mediated diseases, including infectious diseases; neoplasms; endocrine, nutritional and metabolic diseases; mental and behavioral disorders; neurological diseases; diseases of the eye and adnexa; cardiovascular diseases; respiratory diseases; digestive diseases; diseases of the skin and subcutaneous tissue; diseases of the musculoskeletal system and connective tissue; or congenital malformations, deformations and chromosomal abnormalities.

Oxadiazole amine derivative compounds as histone deacetylase 6 inhibitor, and the pharmaceutical composition comprising the same

An electronic device and an method of operating an electronic device according to various example embodiments include: acquiring one of a plurality of pieces of identification information which are already registered; setting one of a plurality of function sets which are already registered based on the acquired identification information; and allowing access based on the set function set.

Electronic device and operating method thereof

A method of manufacturing a reticle, the method including preparing a substrate, determining position data of a pattern to be formed on the substrate, and setting a primary exposure condition to form the pattern; performing a primary exposure simulation regarding the substrate based on the position data of the pattern and the primary exposure condition; calculating a primary deformation rate of the substrate, which is generated in the primary exposure simulation; correcting the position data of the pattern based on the primary deformation rate of the substrate to provide a corrected position data of the pattern; and exposing the substrate under the primary exposure condition based on the corrected position data of the pattern.

Method of correcting mask pattern and method of manufacturing reticle

Disclosed is an electron beam lithography method. The method comprises obtaining a target pattern having a first width to be formed on a substrate, acquiring a dose pattern including a fixed dose cell which corresponds to a region of the dose pattern with a constant dose amount of electron beam to be provided onto the substrate and a variable dose cell which corresponds to a region of the dose pattern with a variable dose amount which is varied based on the first width of the target pattern, and providing the electron beam to expose the substrate according to the dose pattern.

Electron beam lithography method and apparatus

An exposure method includes designing a target pattern to be formed on a substrate, producing a first dose map having first dose values of beams of energy, e.g., electron beams, creating from the first dose map a second dose map having second dose values different from the first dose values, and irradiating regions of a layer of photoresist on the substrate with overlapping beams to expose the regions to doses of energy having values based on the second dose values. The photoresist layer may then be developed and used an etch mask. The etch mask may be used to etch a mask layer on a transparent substrate to form a reticle.

Exposure method using electron beam and substrate manufacturing method using the same

Disclosed are an exposure method and a method of manufacturing a mask and a semiconductor device using the same, which minimize time taken by mask data preparation (MDP) to optimize a total exposure process and enhance a quality of a pattern by using an inverse solution concept, based on a multi-beam mask writer. The exposure method includes receiving mask tape output (MTO) design data obtained through optical proximity correction (OPC), preparing mask data, including a job deck, for the MTO design data without a data format conversion, performing complex correction, including proximity effect correction (PEC) of an error caused by an e-beam proximity effect and mask process correction (MPC) of an error caused by an exposure process, on the mask data, generating pixel data, based on data for which the complex correction is performed, and performing e-beam writing on a substrate for a mask, based on the pixel data.

Exposure methods using e-beams and methods of manufacturing masks and semiconductor devices therefrom

An exposure system includes a data processing part that forms an exposure layout and an exposure part that irradiates an electron beam at a photoresist layer according to the exposure layout. The data processing part generates a control parameter for driving the exposure part without a pattern position error and a beam drift error and to prevent a discrepancy between the exposure layout and a mask layout to be formed in the photoresist layer. A controlling part controls the exposure part according to the control parameter.

Electron beam exposure system and methods of performing exposing and patterning processes using the same

An exposure method may include: radiating a charged particle beam in an exposure system comprising a beam generator, radiating the beam, and main and auxiliary deflectors deflecting the beam to determine a position of a beam shot; determining whether a deflection distance from a first position of a latest radiated beam shot to a second position of a subsequent beam shot is within a first distance in a main field area of an exposure target area, the main field area having a size determined by the main deflector; setting a settling time according to the deflection distance so that a settling time of the subsequent beam shot is set to a constant minimum value, greater than zero, when the deflection distance from the first position to the second position is within the first distance; and deflecting the beam using the main deflector based on the set settling time.

Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same

A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter. A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.

Photolithography patterning system using feature parameters

A central control apparatus and method thereof include a traffic demand receiving unit, a traffic demand calculating unit, a base station efficiency calculating unit, and a base station management unit. The traffic demand receiving unit is configured to receive a required traffic demand and a current location of each of terminals. The traffic demand calculating unit is configured to calculate traffic of each of base stations to which a terminal is unassigned. The base station efficiency calculating unit is configured to calculate an energy efficiency of each of the base stations. The base station management unit configured to verify a base station with an optimum energy efficiency, to activate the base station with the optimum energy efficiency, and to assign the terminals of a corresponding region to the base station with the optimum energy efficiency.

Central control apparatus and method for energy efficiency of a base station in a mobile communication system

An eMMC includes flash memory including an extended card specific data (CSD) register ('EXT_CSD register'), and an eMMC controller that controls operation of the flash memory. The eMMC controller is receives a clock from a host via a clock line, receives a SEND_EXT_CSD command from the host via a command line, and provides the host with eMMC information stored in the EXT_CSD register via a data bus in response to the SEND_EXT_CSD command, the eMMC information including maximum operating frequency information for the eMMC.

Embedded multimedia card (eMMC), host controlling eMMC, and method operating eMMC system

An embedded multimedia card (eMMC) includes a clock channel that receives a clock signal from a host, a command channel that receives a command from the host, a plurality of data channels that transmit data to the host, and a return clock channel that transmits a return clock synchronized with the data to the host.

A method of determining a number of antennas, includes calculating a power used by a transmitting device. The method further includes calculating a channel capacity of the transmitting device. The method further includes determining a number of antennas of the transmitting device to be used based on the power and the channel capacity.

Method and apparatus for determining number of antennas in multiple input multiple output (MIMO) communication system

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Yongin-si, South Korea

Jin Hyeock Choi