Samsung Display Co., Ltd.

Samsung Electronics Co., Ltd.

Amazon Technologies, Inc.

Yonsei University

Ltcam Co., Ltd.

Jin-Ho Ju

Sung-Chul Kang

Yang-Ho Jung

Bong-Yeon Kim

Min Hyuck Kang

Hoon Jong Kang

Hyun-Joo Lee

Sung-Kyun Park

Shi-Yul Kim

Dong-Ki Lee

Jeong-Min Park

Yu-Kyung Lee

Yong Hoon Son

Ji-Hyun Kim

Jang-Soo Kim

Hyang-Shik Kong

Sang-Gab Kim

Woo-Geun Lee

Min-Seok Oh

Hi-Kuk Lee

Hong-Kee Chin

Dong-Min Kim

Jun Su Chun

Koichi Sugitani

Hye-Young Ryu

Jae-Sung Kim

Seung Bo Shim

Jae-Jin Lyu

Sang-Il Kim

Hong-Sick Park

Jung-Soo Lee

Ki-Hyun Cho

Chong-Chul Chai

Jae-Ho Lee

Min Gu Kang

Hyeon Bum Lee

Ki-Soo Kim

Hong-Sik Park

Tae-Gyun Kim

Doo-Hee Jung

Dae Ho Kim

Sang-uk Lim

Jean-Ho Song

Joo-Ae Youn

Jung-In Park

Byung-Uk Kim

Woo-Seok Jeon

Gwui-Hyun Park

Jeong Won Kim

Seung-Bo Shim

Jun-Hyuk Woo

Chul-Won Park

Jun-Gi Kim

You-Kyoung Lee

Soo-Im Jeong

Yun-Jung Nah

Eun Jeagal

Dong-Hyun Yu

Jong-Su Han

Kwang-Soo Lee

Jin-Whan Jung

Sang-Woo Whangbo

Yong Duck Son

Kwang-Woo Park

Hoon Chul Kang

Kyoung-Sik Kim

Seung-Hwa Baek

Jung-Hwan Song

Yong Jun Park

Kwang Woo Park

Jeong-Won Kim

Yong-Jun Park

Bong-Woo Lee

Seok-Ho Lee

Seung-Uk Lee

Dong-Eon Lee

Jong-kwang Lee

Seong-Sik Jeon

Jun-Hyung Souk

Hyoc-Min Youn

Kun-Jong Lee

Sung-chul Kang

Jin-Young Choi

Byung-uk Kim

Sae-Tae Oh

Yong-kyun Ko

Jin-Sun Kim

Seon-Su Sin

Soo-Won Lee

Tai-Hoon Yeo

Dong-Myung Kim

Joo-Kyoung Park

Won-Young Lee

Dong-ki Lee

Jae-Woong Mun

Hyo-Youl Kim

Ki-Sik Choi

Doek-Man Kang

Sho-Hak Nam

Weon-Woo Choi

An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

Exposure mask and method of manufacturing a substrate using the exposure mask

A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.

Mask for photolithography, method of manufacturing the same and method of manufacturing substrate using the same

A display panel includes a substrate, a thin-film transistor (TFT) disposed on the substrate, a first electrode electrically connected to the thin-film transistor, a roof layer disposed on the first electrode and a liquid crystal layer. The roof layer includes an organic insulating material, and defines a cavity that overlaps the first electrode. The liquid crystal layer is disposed in the cavity and is in direct contact with the roof layer.

Display panel and method of manufacturing the same

A display device includes a substrate including a first region and a second region, a gate line and a data line on the substrate, a thin film transistor on the substrate, being connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, wherein the second region has a second contact hole of which an area is larger than that of a first contact hole of the first region.

Display device and method of manufacturing the same

In a display panel, a thin film transistor is connected to a gate line and a data line, and includes a gate electrode, a semiconductor pattern, a source electrode and a drain electrode. An organic pattern makes contact with a side surface of the data line and a side surface of the thin film transistor, and the organic pattern overlaps pixel areas of the display panel. A first passivation layer is on the data line, the thin film transistor and the organic pattern. A common electrode is on the first passivation layer, and the common electrode overlaps the pixel areas. A second passivation layer covers the common electrode. A pixel electrode is on the second passivation layer, the pixel electrode overlaps the common electrode, and the pixel electrode is electrically connected to the drain electrode through a first contact hole and the data line through a second contact hole.

A substrate for an electrowetting display device including a pixel electrode, a partition wall pattern and a water-repellent pattern. The pixel electrode is formed on a base substrate. The partition wall pattern is disposed along an edge of the pixel electrode to expose the pixel electrode. The water-repellent pattern is disposed at a space formed by the pixel electrode and the partition wall pattern to be extended along a lower portion of side surfaces of the partition wall pattern from an area on which the pixel electrode is formed. The water-repellent pattern exposes an upper portion of the side surfaces and an upper surface of the partition wall pattern. Thus, a manufacturing reliability of a substrate for an electrowetting display device is improved to prevent a display quality from being reduced.

Substrate for an electrowetting display device and method of manufacturing the substrate

A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.

Cleaning composition and method of manufacturing metal wiring using the same

A thin film transistor substrate includes a gate electrode on a base substrate, an active pattern on the gate electrode, a source electrode on a first end of the active pattern, a drain electrode on a second end of the active pattern, an organic insulation layer on the source electrode and the drain electrode, and a transparent electrode contacting the drain electrode through a contact opening in the organic insulation layer. The drain electrode is spaced from the source electrode. The organic insulation layer includes a first thickness portion around the contact opening and a second thickness portion adjacent to the first thickness portion. The second thickness portion has a thickness greater than that of the first thickness portion.

Thin film transistor substrate, liquid crystal display device having the same and method of manufacturing the same

A mask includes a transparent substrate and a light blocking pattern. The light blocking pattern includes a light blocking part and a diffraction pattern. The light blocking part is disposed on the transparent substrate and is configured to block light. The diffraction pattern includes a plurality of protrusion parts and is configured to diffract the light. The plurality of protrusion parts protrudes from a side of the blocking part and is separated from each other.

Mask, method of manufacturing the same, and method of manufacturing a display panel using the same

A complex substrate for a display apparatus, the complex substrate includes a lower base substrate including convex and concave patterns, the convex and concave patterns being integral with an upper side of the lower base substrate, a planarizing layer on the lower base substrate, the planarizing layer being integral with the convex and concave patterns, and the planarizing layer having different refractivity from the lower base substrate, and a wire grid pattern on the planarizing layer, the wire grid pattern including a plurality of nano wire metal patterns, each of the nano wire metal patterns having a width of no more than a micrometer.

Complex substrate for display apparatus, display apparatus having the same and method of manufacturing the same

A display substrate includes a substrate having a first region and a second region, a conductive pattern is provided in the first region of the substrate and includes a first conductive pattern and a second conductive pattern, the first conductive pattern has a gate electrode and a source electrode, the second conductive pattern has a source electrode and a drain electrode, an insulation layer pattern is positioned on the conductive pattern and exposes an outer sidewall of the conductive pattern, an organic layer is provided in the first region and the second region of the substrate and covers the insulation layer pattern, and a pixel electrode is provided on the organic layer and is electrically connected to the drain electrode through a contact hole in the organic layer.

Display substrate and method of manufacturing the display substrate

A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.

Photo mask and method of manufacturing the same

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Seoul, South Korea

Jin-Ho Ju