International Business Machines Corporation

Jin Fuw Lee

Fook-Luen Heng

Rama Nand Singh

Lars W Liebmann

Mark Alan Lavin

John Maxwell Cohn

James A Culp

Ulrich Alfons Finkler

Gregory Allen Northrop

Leon Stok

Nakgeuon Seong

Pieter J Woeltgens

Geng Han

Chao Yi Tien, Legal Representative

Pieter J Woltgens

A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.

Physical design system and method

A method of physical design for integrated circuit (IC) chip fabrication, physical design system and program product therefor. A design shape is fragmented into segments for Optical Proximity Correction (OPC) and a harmonic mean of the segments is determined. Electrical intent is determined for the shape and a harmonic mean is determined for the segments. Segments may be moved based on a effect on the harmonic mean from moving the segments, measured using a harmonic mean cost function. Finally segmented shapes are passed to OPC.

Optimizing integrated circuit chip designs for optical proximity correction

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Yorktown Heights, NY, United States of America

Jin Fuw Lee