Samsung Electronics Co., Ltd.

Jin-a Kim

Yong-kwan Kim

Se-keun Park

Joo-Young Lee

Cha-Won Koh

Yeong-Cheol Lee

Ho-in Ryu

Jung-Woo Song

An integrated circuit (IC) device includes a line structure including a conductive line formed on a substrate and an insulation capping pattern that covers the conductive line; an insulation spacer covering a sidewall of the line structure; a conductive plug spaced apart from the conductive line in a first horizontal direction with the insulation spacer between the conductive plug and the conductive line; a conductive landing pad arranged on the conductive plug to vertically overlap the conductive plug; and a capping layer including a first portion between the conductive landing pad and the insulation capping pattern, wherein the first portion of the capping layer has a shape in which a width in the first horizontal direction gradually increases as a distance from the substrate increases between the conductive landing pad and the insulation capping pattern.

Integrated circuit (IC) device

A semiconductor device includes a bit line structure on a substrate, a spacer structure including a first spacer directly contacting a sidewall of the bit line structure, a second spacer directly contacting a portion of an outer sidewall of the first spacer, the second spacer including air, and a third spacer directly contacting an upper portion of the first spacer and covering an outer sidewall and an upper surface of the second spacer, and a contact plug structure extending in a vertical direction substantially perpendicular to an upper surface of the substrate and directly contacting an outer sidewall of the third spacer at least at a height between respective heights of a bottom and a top surface of the second spacer.

Semiconductor device having bit line structure with spacer structure and method of manufacturing the same

A semiconductor device and methods of manufacturing the same are provided. The semiconductor device includes a substrate, buried semiconductor layers, a word line, a bit line, buried contacts, and insulation spacers, and a charge storage. The substrate has active regions and field regions. The buried semiconductor layers are buried in the substrate at the active regions. The word line is buried in the substrate and crosses one of the active regions. The bit line is disposed in one of the active regions. The buried contacts are disposed on the active regions and the field regions. The insulation spacers are disposed on the substrate and on a sidewall of the buried contacts, respectively. The charge storage is disposed on one or more of the buried contacts. The buried semiconductor layers contact, respectively, one of the buried contacts and one of the insulation spacers.

Semiconductor device and method of manufacturing the same

A semiconductor device and methods of manufacturing the same are provided. The semiconductor device includes a substrate, word lines, a doped junction, bit line structures, and buried contacts. The substrate has active regions. The word lines extend across the active regions. The doped junction has impurities and is arranged at the active regions, and includes first junctions and second junctions, each first junction arranged at a central portion of one of the active regions and each second junction arranged at an end portion of another one of the active regions, a buried semiconductor layer being included in each second junction. The bit line structures contact with a respective one of the first junctions. The buried contacts are arranged in a matrix shape, each contacting with a respective one of the second junctions and the included buried semiconductor layer and simultaneously contacting with a charge storage for storing data.

Growing community of inventors

Hwaseong-si, South Korea

Jin-a Kim