Asml Netherlands B.v.

Jim Vincent Overkamp

Adrianus Hendrik Koevoets

Rogier Hendrikus Magdalena Cortie

Raymond Wilhelmus Louis Lafarre

Nicolaas Ten Kate

Johannes Henricus Wilhelmus Jacobs

Martijn Houben

Thibault Simon Mathieu Laurent

Ruud Hendrikus Martinus Johannes Bloks

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Siegfried Alexander Tromp

Michel Riepen

Cornelius Maria Rops

Koen Steffens

Antonius Franciscus Johannes De Groot

Jan Steven Christiaan Westerlaken

Theodorus Wilhelmus Polet

Niek Jacobus Johannes Roset

Wilhelmus Franciscus Johannes Simons

Sander Catharina Reinier Derks

Han Henricus Aldegonda Lempens

Gerben Pieterse

Henricus Jozef Castelijns

Franciscus Johannes Joseph Janssen

Frits Van Der Meulen

Johan Gertrudis Cornelis Kunnen

Gosse Charles De Vries

Arie Jeffrey Den Boef

Andre Bernardus Jeunink

Nitesh Pandey

Christianus Wilhelmus Johannes Berendsen

Evgenia Kurganova

Tamara Druzhinina

Koos Van Berkel

Alexey Olegovich Polyakov

Teis Johan Coenen

Harmen Klaas Van Der Schoot

Sebastianus Adrianus Goorden

Leon Martin Levasier

David Ferdinand Vles

Arnoud Willem Notenboom

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Duygu Akbulut

Jacobus Cornelis Gerardus Van Der Sanden

Van Vuong Vy

Menno Fien

Maarten Van Beijnum

Hendrikus Herman Marie Cox

Patricius Jacobus Neefs

Alexander Ludwig Klein

Putra Saputra

Erik Johan Arlemark

Michael Johannes Hendrika Wilhelmina Renders

Martinus Agnes Willem Cuijpers

Albertus Victor Gerardus Mangnus

Paul Corné Henri De Wit

Christiaan Louis Valentin

Johannes Adrianus Cornelis Maria Pijnenburg

Ties Wouter Van Der Woord

Wilfred Edward Endendijk

Johannes Jacobs

Jeroen Van Duivenbode

Alain Louis Claude Leroux

Stan Henricus Van Der Meulen

Edgar Alberto Osorio Oliveros

Guilherme Brondani Torri

Dries Vaast Paul Hemschoote

Luc Roger Simonne Haspeslagh

Ronald Cornelis Gerardus Gijzen

Patrick Willem Paul Limpens

Rogier Cortie

Olivier Christian Maurice Lugier

Sonia Castellanos Ortega

Kjeld Gertrudus Hendrikus Janssen

Johannes Bernardus Charles Engelen

Joost De Hoogh

Daniel Elza Roeland Audenaerdt

Marijke Scotuzzi

Erik Johannes Nieuwenhuis

Ionel Mugurel Ciobica

Bastiaan Maurice Van Den Broek

Halil Gökay Yeǧen

Paul Comé Henri De Wit

Evert Auke Rinze Westerhuis

Halil Gökay Yegen Yegen

Thibault Laurent

Ruud Bloks

Han Lempens

Wilhelmus Simons

Raymond Lafarre

Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.

Method and apparatus for forming a patterned layer of material

A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

High force low voltage piezoelectric micromirror actuator

Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion. The deposited material is annealed to modify the deposited material.

An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.

Object holder, tool and method of manufacturing an object holder

A lithographic apparatuscomprisingincludesan object tablewhich carries an object. The lithographic apparatus may furthercomprise at least oneinclude asensoras part of a measurement systemto measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimatetheadeformation oftheanobject due toavaryingloadsloadduring operation of the lithographic apparatus, for exampleavaryingloadsloadinduced by a two-phase flow in a channel formedwithinofthe object table.Additionally, or alternatively, theThelithographic apparatuscomprisesmay includea predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used toprovide apatterna substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

Lithographic apparatus and an object positioning system

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Support apparatus, lithographic apparatus and device manufacturing method

An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Object holder and lithographic apparatus

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus () for cooling the substrate, wherein the cooling apparatus comprises a cooling element () located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.

A lithographic apparatus comprising: a channel () for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (); a second material () between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material () between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.

Lithographic apparatus and method of manufacturing a lithographic apparatus

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

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Eindhoven, Netherlands

Jim Vincent Overkamp