Rudolph Technologies, Inc.

Jim Onderko

Michael Kotelyanskii

Guray Tas

Manjusha Mehendale

Yanwen Hou

A method includes selecting one of performing ellipsometry or performing optical stress generation and detection. The method also includes, in response to selecting performing ellipsometry, applying at least one first control signal to a controllable retarder that modifies at least polarization of a light beam, and performing ellipsometry using the modified light beam. The method further includes, in response to selecting performing optical stress generation and detection, applying at least one second control signal to the controllable retarder, and performing optical stress generation and detection using the modified light beam. Apparatus and computer readable media are also disclosed.

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Gibsonia, PA, United States of America

Jim Onderko