USA As Represented by Secretary of the Navy

Jill A Nolde

Edward H Aifer

Jerry R Meyer

Igor Vurgaftman

Chadwick Lawrence Canedy

Glenn Jernigan

Eric M Jackson

Erin Cleveland

An infrared detector and a method for forming it are provided. The detector includes absorber, barrier, and contact regions. The absorber region includes a first semiconductor material, with a first lattice constant, that produces charge carriers in response to infrared light. The barrier region is disposed on the absorber region and comprises a superlatice that includes (i) first barrier region layers comprising the first semiconductor material, and (ii) second barrier region layers comprising a second semiconductor material, different from, but lattice matched to, the first semiconductor material. The first and second barrier region layers are alternatingly arranged. The contact region is disposed on the barrier region and comprises a superlattice that includes (i) first contact region layers comprising the first semiconductor material, and (ii) second contact region layers comprising the second semiconductor material layer. The first and second contact region layers are alternatingly arranged.

Methods and apparatuses for improved barrier and contact layers in infrared detectors

Bolometers and methods of forming the same are provided. A bolometer that includes a substrate, a support structure comprising at least one SiGe layer and at least one Si layer, an absorber comprising reduced graphene oxide, and a thermistor comprising partially reduced graphene oxide are described. Also described are methods for forming bolometers and the parts contained therein.

High speed graphene oxide bolometers and methods for manufacturing the same

A device including an absorber layer that can be deposited on top of a bottom contact layer. Furthermore, a semi-intrinsic layer with an energy gap wider than that of the absorber layer can be deposited on top of the absorber layer. A top contact layer can be deposited on top of the semi-intrinsic layer. A conduction band and a valence band energy alignment can be positioned between the absorber layer and the top contact layer, and configured to allow photoexcited minority carriers to be collected while the flow of majority carriers from the absorber are blocked. At least one mesa can be formed by processing and removing layered materials to a depth at least near the bottom of the absorber layer. Finally, a shoulder can be formed in the at least one mesa within the semi-intrinsic layer by processing and removing the layered materials.

Reticulated shallow etch mesa isolation

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Takoma Park, MD, United States of America

Jill A Nolde