Boe Technology Group Co., Ltd.

Beijing Boe Display Technology Co., Ltd.

Jikai Zhang

Tonghua Yang

Min Li

Hongjiang Wu

Jiyu Wan

Gyuhyun Lee

Dan Wang

Sikai Zhang

He Feng

Seungmoo Rim

A method for manufacturing a color photoresist pattern in a color filter is provided. The method includes applying a layer of negative color resist onto a substrate; exposing the layer of negative color resist through a mask; and developing the exposed layer of negative color resist with a developer composition which comprises 0.01 to 5.0 parts by weight of inorganic or organic acids, 0.01 to 5.0 parts by weight of surfactant, 0.1 to 10.0 parts by weight of water-soluble organic solvent, 85 to 99 parts by weight of water, and 0 to 2 parts by weight of additives, based on 100 parts by weight of the developer composition.

Method for manufacturing color photoresist pattern in color filter

Disclosed are an auto-repairing composition for overcoat layer, a method of producing the same, and a display apparatus. The composition for overcoat layer comprising 1-10 wt % of microcapsules based on the total weight of the composition for overcoat layer, said microcapsule including a capsule wall and a capsule core, wherein the capsule wall comprises an alkali-insoluble resin, and the capsule core comprises, based on the total weight of the capsule core, 30-60 wt % of a photo-curable unsaturated oligomer, 30-60 wt % of a photo-polymerizable monomer, 1-10 wt % of a photo-initiator, and 0-5 wt % of additive.

Auto-repairing compositions for overcoat layer, method of producing the same, and display apparatus

Provided are method for manufacturing a color filter substrate, color filter substrate and display device. The method includes the following steps: providing a substrate; forming a color pixel unit on the substrate; forming a protective layer on the color pixel unit; coating an alignment film paint and a spacer paint on the protective layer in turn, and forming an alignment film and a spacer via a single patterning process or double patterning processes.

Method for manufacturing color filter substrate, color filter substrate and display device

An embodiment of the present invention provides a fly eye lens which is applied to a proximity exposure machine optical system. The fly lens includes a first lens assembly and a second lens assembly, wherein the first lens assembly includes a plurality of lenses which form a first lens face, and the second lens assembly includes a plurality of lenses which form a second lens face. The first lens face is used to split an incident broad light beam into narrow light beams and then refract the narrow light beams onto the second lens face, and the second lens face is used to dispersively refract the received narrow light beams onto a concave mirror in the optical system. A lens closer to a center of the second lens face has a higher transmittivity, and a lens farther from the center of the second lens face has a lower transmittivity. According to the embodiment of the present invention, since different lenses on the second lens face have different transmittivities, the illuminances of light radiated to different regions of a mask plate through the fly eye lens are different, and thus the uniformity of the critical dimensions of the exposed patterns can be improved to a certain extent.

Fly eye lens and proximity exposure machine optical system

The disclosed technology provides a manufacturing method of a target comprising obtaining an initial mass and a residual mass of the target sample, and calculating an etching mass; determining a relative etching depth of the target sample; calculating a relative etching mass based on the etching mass and the relative etching depth; determining a utilization parameter of the target sample based on the relative etching mass and the initial mass of the target sample before being used; and performing a simulation and optimization process on the utilization parameter of the target sample, obtaining target parameters corresponding to a preset value of the utilization parameter, and outputting the target parameters to a manufacturing control center for manufacturing a target. The disclosed technology also provides a manufacturing system of a target.

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Beijing, China

Jikai Zhang