Intel Corporation

Jieying Kong

Gang Duan

Zhiguo Qian

Srinivas V Pietambaram

Brandon C Marin

Dilan Seneviratne

Suddhasattwa Nad

Kemal Aygün

Sarah Blythe

Ala Omer

Leonel R Arana

Jeremy D Ecton

Tarek A Ibrahim

Dingying David Xu

Sri Chaitra Jyotsna Chavali

Praneeth Kumar Akkinepally

Frank Truong

Hongxia Feng

Whitney Michael Bryks

Marcel Arlan Wall

Bohan Shan

Bainye Francoise Angoua

Wei Wei

Patrick Quach

Yi Yang

Christy Sennavongsa

Ao Wang

Junxin Wang

Yiyang Zhou

Jason Steill

Substrate assemblies having adhesion promotor layers and related methods are disclosed. An example apparatus includes a substrate, a dielectric layer, a first copper layer between the substrate and the dielectric layer, and a film between the dielectric layer and the first copper layer. The film including silicon and nitrogen and being substantially free of hydrogen. A via in the dielectric layer is to provide access to the first copper layer. A portion of the first copper layer uncovered in the via, a wall of the via and the portion of the first copper layer to be substantially free of fluorine. A seed copper layer positioned on the dielectric layer. The via wall and the portion of the first copper layer. The seed copper layer and the first copper layer define an undercut at an interface between the seed copper layer and the first copper layer.

Substrates having adhesion promotor layers and related methods

Embodiments described herein may be related to apparatuses, processes, and techniques directed an optical waveguide formed in a glass layer. The optical waveguide may be formed by creating a first trench extending from a surface of the glass layer, and then creating a second trench extending from the bottom of the first trench, then subsequently filling the trenches with a core material which may then be topped with a cladding material. Other embodiments may be described and/or claimed.

Optical waveguide formed within in a glass layer

Embodiments disclosed herein include hybrid cores for electronic packaging applications. In an embodiment, a package substrate comprises a plurality of glass layers and a plurality of dielectric layers. In an embodiment, the glass layers alternate with the dielectric layers. In an embodiment, a through-hole through the plurality of glass layers and the plurality of dielectric layers is provided. In an embodiment a conductive through-hole via is disposed in the through-hole.

Hybrid glass core for wafer level and panel level packaging applications

Embodiments disclosed herein include electronic packages and methods of forming such packages. In an embodiment, an electronic package comprises a first buildup layer and a second buildup layer over the first buildup layer. In an embodiment, a void is disposed through the second buildup layer. In an embodiment the electronic package further comprises a first pad over the second buildup layer. In an embodiment, the first pad covers the void.

Minimizing package impedance discontinuity through dielectric structure optimizations

An integrated circuit (IC) package substrate, comprising a metallization level within a dielectric material. The metallization level comprises a plurality of conductive features, each having a top surface and a sidewall surface. The top surface of a first conductive feature of the plurality of conductive features has a first average surface roughness, and the sidewall surface of a second conductive feature of the plurality of conductive features has a second average surface roughness that is less than the first average surface roughness.

Selectively roughened copper architectures for low insertion loss conductive features

Embodiments of the present disclosure may generally relate to systems, apparatus, and/or processes directed to a manufacturing process flow for packages that include one or more glass layers that include patterning features, such as electrically conductive traces, RDLs, and vias within the packages. In embodiments, a package may include a glass layer with a first side and a second side opposite the first side, where the glass layer is a dielectric layer. The package may include another layer coupled with the first side of the glass layer, and a pattern on the second side of the glass layer to receive a deposited material in at least a portion of the pattern.

Glass dielectric layer with patterning

Embodiments include package substrates and methods of forming the package substrates. A package substrate includes a first conductive layer in a first dielectric, a second dielectric over the first dielectric, and a second conductive layer in the second dielectric, where the second conductive layer includes first and second traces. The package substrate also includes a third conductive layer over the second dielectric, and a high dielectric constant (Dk) and low DK regions in the first and second dielectrics, where the high Dk region surrounds the first traces, and where the low Dk region surrounds the second traces. The high Dk region may be between the first and third conductive layers. The low Dk region may be between the first and third conductive layers. The package substrate may include a dielectric region in the first and second dielectrics, where the dielectric region separates the high Dk and low Dk regions.

Optimal signal routing performance through dielectric material configuration designs in package substrate

A substrate for an electronic device may include one or more interconnect pockets. Each of the interconnect pockets may be defined by a first pocket wall and a second pocket wall that may extend between the first pocket wall and the second exterior surface of the substrate. The second pocket wall may extend from the first pocket wall at a wall angle that is greater than or equal to 90 degrees. Individual interconnects may be located within respective individual ones of the interconnect pockets.

Electronic device including a substrate having interconnects

Growing community of inventors

Chandler, AZ, United States of America

Jieying Kong