Applied Materials, Inc.

Jiecong Tang

Abhijit Basu Mallick

John Leonard Sudijono

Mark Joseph Saly

Bhaskar Jyoti Bhuyan

Susmit Singha Roy

Eswaranand Venkatasubramanian

Zeqing Shen

Kian Ping Loh

Vicknesh Sahmuganathan

Jiteng Gu

Xinke Wang

Zhongxin Chen

Sze Chieh Tan

Haisen Xu

Yuanxing Han

Apparatuses and methods for forming a film on a substrate are described. The film is formed on the substrate by depositing an adamantane monomer and an initiator on the substrate to form a polymerizable seed layer and curing the polymerizable seed layer to form a polyadamantane layer.

Method of forming a diamond film

Methods of selectively depositing a carbon-containing layer are described. Exemplary processing methods may include flowing a first precursor over a substrate comprising a metal surface and a non-metal surface to form a first portion of an initial carbon-containing film on the metal surface. The methods may include removing a first precursor effluent from the substrate. A second precursor may then be flowed over the substrate to react with the first portion of the initial carbon-containing layer. The methods may include removing a second precursor effluent from the substrate. The methods may include pre-treating the metal surface of the substrate to form a metal oxide surface on the metal surface.

Area selective carbon-based film deposition

Growing community of inventors

Singapore, Singapore

Jiecong Tang