International Business Machines Corporation

Samsung Electronics Co., Ltd.

Lam Research Corporation

Cypress Semiconductor Corporation

Jie Zhang

Yun Yu Wang

Ping Wang

You-Chin Gene Fuh

Chan-Lon Yang

Patrick Dooling Bossman

Robert G O'Neill

Chan-Hua Liu

Jingwen Zhu

Neil M P Benjamin

Vinay Krishna

Dawei Li

Shalini Ghosh

Junting Zhang

Methods, devices, and computer-readable media for multi-task based lifelong learning. A method for lifelong learning includes identifying a new task for a machine learning model to perform. The machine learning model trained to perform an existing task. The method includes adaptively training a network architecture of the machine learning model to generate an adapted machine learning model based on incorporating inherent correlations between the new task and the existing task. The method further includes using the adapted machine learning model to perform both the existing task and the new task.

Multi-task based lifelong learning

Disclosed herein are various embodiments, including an electrostatic screen for use in a plasma processing chamber with a plurality of electrical leads. A plurality of petal groups is provided with each petal group comprising a substantially-flat structure, wherein each petal group is electrically connected to at least one electrical lead of the plurality of electrical leads and wherein each petal group is insulated from any other petal group, wherein the plurality of petal groups form a radial symmetry around a vertical axis. Each substantially flat structure comprises a sector of a conductive annulus and a plurality of conductive petals, each connected to the sector of the conductive annulus, wherein the at least one electrical lead is connected to substantially equal potential locations in each petal group.

Application of powered electrostatic faraday shield to recondition dielectric window in ICP plasmas

A method for processing a semiconductor topography which includes removing metal oxide layers from the bottom of contact openings is provided. In some embodiments, the method may include etching openings within a dielectric layer to expose conductive and silicon surfaces within the semiconductor topography is provided. In such cases, the method further includes exposing the semiconductor topography to an etch process adapted to remove metal oxide material from the conductive surfaces without substantially removing material from the silicon surfaces. In some cases, the etch chemistry used for the etch process may include sulfuric acid. In addition or alternatively, the etch chemistry may include hydrogen peroxide. In any case, the etch chemistry may be distinct from chemistries used to remove residual matter generated from the etch process used to form the openings within the dielectric and/or the removal of the masking layer used to pattern the openings.

Methods for cleaning contact openings to reduce contact resistance

Provided are a method, system, an program for tuning a database query. Provided are a base access plan to implement the database query and statistics including information on a layout of the database against which the query will be executed. The statistics are processed to determine performance problems with the base access plan as part of a first analysis of the base access plan and the determined performance problems are processed as part of a second analysis to provide an analysis of the determined performance problems and processing cost of the base access plan. Recommendations are generated to tune the base access plan to improve performance.

Method, system, and program for performance tuning a database query

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San Jose, CA, United States of America

Jie Zhang