Taiwan Semiconductor Manufacturing Comp. Ltd.

Jie Jay Sun

Ru-Shang Hsiao

I-Shan Huang

Po-Ying Chen

Chen-Bin Lin

The present disclosure discloses a structure and a method directed to a semiconductor structure having a resistor structure and a metal-insulator-metal (MIM) capacitor structure formed by a single mask process. The semiconductor structure includes an interconnect structure on a substrate, a first insulating layer on the interconnect structure, first and second conductive plates on the first insulating layer and separated by a second insulating layer, a dielectric layer on the first conductive plate, and a third conductive plate on the dielectric layer. Bottom surfaces of the first and second conductive plates are coplanar.

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HSINCHU, Taiwan

Jie Jay Sun