Changxin Memory Technologies, Inc.

Jiayun Zhang

Zhongming Liu

Yexiao Yu

Jia Fang

Xinman Cao

A method for manufacturing a semiconductor structure includes: providing a substrate, a first mask and a second mask, etching the substrate by respectively using the first mask and the second mask, so as to form first grooves and second grooves on the substrate, wherein regions, in the substrate, where the first grooves and the second grooves are located form bit line grooves; and forming a conductive layer in each of the bit line grooves.

Method for manufacturing semiconductor structure, and semiconductor structure

A manufacturing method for memory includes providing a substrate; forming a first isolation layer on the substrate; forming a first mask layer on the first isolation layer; forming a second isolation layer on the first mask layer and part of the first isolation layer; forming a second mask layer on the second isolation layer; removing part of the second mask layer and part of the second isolation layer; removing the first mask layer and the remaining second mask layer; forming a third mask layer on the first isolation layer and the remaining second isolation layer; removing part of the third mask layer; and etching the remaining part of the second isolation layer and the first isolation layer below the second isolation layer, by taking the remaining third mask layer as a mask.

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Hefei, China

Jiayun Zhang