Boe Technology Group Co., Ltd.

Beijing Boe Technology Development Co., Ltd.

Hefei Xinsheng Optoelectronics Technology Co., Ltd.

Boe Technology Groupco., Ltd.

Jianye Zhang

Wei Li

Wei Liu

Xing Zhang

Ying Han

Fengjuan Liu

Youngsuk Song

Ning Li

Hongda Sun

Xuehuan Feng

Yang Zhang

Pan Xu

Rui Ma

Tongshang Su

Quanhu Li

Guangyao Li

Yingbin Hu

Jiangbo Chen

Jifeng Shao

Yuhang Lu

A thin film transistor including: a base substrate, and an active layer and a gate on the base substrate, where the active layer includes a first part and a second part, a conductivity of the second part is greater than a conductivity of the first part; an orthographic projection of the gate on the base substrate covers an orthographic projection of the first part on the base substrate, and the orthographic projection of the gate on the base substrate does not overlap an orthographic projection of the second part on the base substrate; and the first part includes a plurality of first sub-parts, and two sides of any one first sub-part in a trend direction of the active layer are each connected to the second part.

Thin film transistor and display panel

A display panel includes a thin film transistor layer (), a grating layer (), a transparent anode layer (), an emission layer (), and a colored layer () opposite the emission layer (). The colored layer () may include a plurality of color filters. The grating layer () may be between the thin film transistor layer () and the transparent anode layer (). The grating layer () may include a plurality of blazed gratings corresponding to the plurality of color filters, respectively.

Display panel, fabricating method thereof, and display apparatus

An array substrate, a display panel including the array substrate, and a fabrication method of the array substrate are provided. The array substrate includes a base substrate, a light-shielding portion, a thin-film transistor and a capacitor. The light-shielding portion is formed on a first surface of the base substrate. The thin-film transistor is formed on a side of the light-shielding portion away from the base substrate, and includes an active layer. The capacitor is formed on the first surface of the base substrate, and includes a first capacitive electrode and a second capacitive electrode. The first capacitive electrode and the second capacitive electrode are at least partially arranged opposite to each other in a direction perpendicular to the first surface of the base substrate. The first capacitive electrode is provided in a same layer as the light-shielding portion.

Array substrate having light-shielding portion and display panel

The present disclosure provides a positive photoresist composition including a major adhesive material and a photosensitizer, wherein the photoresist composition further includes a photoisomerizable compound which would be converted into an ionic structure with an increased degree of molecular polarity after ultraviolet irradiation. The formation of the ionic structure with increased polarity of the molecule reduces the adhesion between the positive photoresist and the organic film layer, facilitates stripping after formation of the via, and improves the product rate of pass. Further, the present disclosure provides a via-forming method using the positive resist composition, a display substrate including the via formed by the via-forming method, and a display device including the display substrate.

Positive photoresist composition, via-forming method, display substrate and display device

A display substrate, a manufacturing method thereof, a display panel, and a display device are provided. The method for manufacturing a display substrate includes: forming a thin film transistor on a base substrate; forming a planarization layer covering the thin film transistor; forming a metal mask layer on the planarization layer; patterning the metal mask layer to form an etching hole in the metal mask layer, the etching hole exposing a portion of the planarization layer; etching the portion of the planarization layer exposed by the etching hole to form a first via hole penetrating the planarization layer, and removing a remaining metal mask layer on the planarization layer.

Display substrate, manufacturing method thereof, display panel, and display device

The present disclosure is related to a display panel. The display panel may include an emission layer, a colored layer opposite the emission layer, and a grating between the emission layer and the colored layer. The colored layer may include a plurality of color filters and a plurality of black matrixes among the plurality of color filters. Orthographic projection of the grating on the colored layer may fall within orthographic projection of one of the plurality of black matrixes on the colored layer.

Display panel, manufacturing method thereof, and display apparatus

A manufacturing method of OLED microcavity structure is provided. The manufacturing method includes: forming a reflective anode on a substrate; forming a transparent conductive film layer having a thickness corresponding to a required pixel on the reflective anode; patterning the transparent conductive film layer and the reflective anode with a pixel mask corresponding to the required pixel to form a pattern of the required pixel; and repeating the above steps on a resultant structure surface according to display requirements until a pixel display structure required by a display device is obtained.

Manufacturing method of OLED microcavity structure

The present disclosure relates to the field of display technologies, and provides an array substrate. The array substrate includes a plurality of pixel units distributed in an array, each of the pixel units includes a plurality of sub-pixels, and each of the sub-pixels includes at least one metal layer and a light emitting layer. At least one of the sub-pixels further includes a reflective anode layer formed in the same layer as one of the at least one metal layer, where the reflective anode layer has a transparent conductive layer at a side of the reflective anode layer adjacent to the light emitting layer, and transparent conductive layers of at least two different sub-pixels have different thicknesses.

Array substrate, manufacturing method, display panel for forming transparent conductive layers of different thicknesses

The present disclosure provides a top-gate thin film transistor, a manufacturing method thereof, and an array substrate and a display panel each comprising the top-gate thin film transistor. The top-gate thin film transistor comprises a light-shielding layer formed between the base substrate and the active layer and made of a non-metallic material. The non-metallic material may be a silicone material, such as a polyhedral oligomeric silsesquioxane or a linear silicone resin.

Top-gate thin film transistor, manufacturing method thereof, array substrate and display panel comprising top-gate thin film transistor

A method for manufacturing an organic light-emitting diode substrate is provided and includes: on a base substrate with a black matrix pattern, forming a conductive layer covering the black matrix pattern and a photoresist pattern that partially stacks on the conductive layer, through one patterning process by taking the black matrix pattern as a mask plate; and removing the photoresist pattern and portions of the conductive layer that stack on the photoresist pattern, thereby forming a patterned conductive layer.

Method for manufacturing OLED substrate

The present disclosure provides an OLED array substrate comprising a plurality of pixel units each including a plurality of sub-pixel units, each of the sub-pixel units comprising a light-emitting portion, each light-emitting portion having a first electrode, a second electrode and an organic light-emitting layer sandwiched between the first electrode and the second electrode, wherein the sub-pixel unit further comprises an organic film layer and a semi-reflecting mirror layer disposed successively on a light exit side of the second electrode, the first electrode comprises a reflective layer, the second electrode is a transparent electrode, a structure between the first electrode and the semi-reflecting mirror layer constitutes a microcavity structure, and organic film layers of the sub-pixel units of different colors of each pixel unit have different thicknesses. The present disclosure further provides an OLED display panel, an OLED display device, and a method of manufacturing the array substrate.

OLED array substrate with microcavity structure, and OLED display panel

A method for fabricating a TFT-containing backplate is disclosed. The method includes forming a top-gate TFT on a substrate. The top-gate TFT includes a gate insulating layer which includes a negative silicone light shielding material. A TFT-containing backplate is also disclosed.

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Beijing, China

Jianye Zhang