Quantum Global Technologies LLC

Applied Materials, Inc.

Jiansheng Wang

Joseph Frederick Sommers

Satyanarayana Adamala

Ronald Trahan

David Do

Samantha SiamHwa Tan

In an embodiment, a method of measuring nanoparticles from a sample using single particle inductively coupled plasma mass spectrometry (spICPMS) includes separating the nanoparticles from a surface of the sample by: exposing the surface to a first exposure surface of a first liquid medium; and mechanically manipulating the first liquid medium; and measuring the first liquid medium using spICPMS. In an embodiment, a method of detecting nanoparticle contamination in a processing chamber includes removing a first component from the processing chamber subsequent to a processing operation; and measuring first nanoparticles from the first component using spICPMS, comprising: separating the first nanoparticles from a first surface of the first component by: exposing a first portion of the first surface to a first exposure surface of a first liquid medium; and mechanically manipulating the first liquid medium.

Nanoparticle measurement for processing chamber

Embodiments of the present disclosure generally relate to cleaning substrates, and more particularly, to methods and apparatus for endpoint detection of a cleaning process. The apparatus includes an outer cleaning basin, a liner, and a circulation system coupled to the liner. The circulation system includes a filter for removing particles from a fluid. A liquid particle counter is fluidly coupled to fluid in the liner for performing particle counting. Methods for using the apparatus are also described.

Liquid particle counting of semiconductor component parts

Embodiments of the present invention generally relate to a method and apparatus for ex-situ cleaning of a chamber component part. In one embodiment, a system for cleaning component parts in a cleaning chemistry is provided. The system comprises a wet bench set-up comprising a cleaning vessel assembly for holding one or more component parts to be cleaned during a cleaning process and a detachable cleaning cart detachably coupled with the cleaning vessel assembly for supplying one or more cleaning chemistries to the cleaning vessel assembly during the cleaning process.

Method and apparatus for showerhead cleaning

In one aspect, a method of improving the performance of an electronic device manufacturing facility is provided, including the step of reducing the number of electronic device manufacturing component seasoning steps which are performed using production equipment, whereby the amount of electronic device manufacturing system downtime is reduced. Several other aspects are provided.

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Union City, CA, United States of America

Jiansheng Wang