Sachem, Inc.

Jianjun Hao

Craig S Allen

Craig Allen

James C Knight

Disclosed is a process for coating onto a substrate, including preparing a precursor having a general formula QMOFby a reaction M(OH)+yHF+m/nQ(OH)&#x2192;Q(MOF), wherein Q is an onium ion, selected from quaternary alkyl ammonium, quaternary alkyl phosphonium and trialkylsulfonium; M is a metal capable of forming an oxofluorometallate, where M may further comprise one or more additional metal, metalloid, and one or more of phosphorus (P), sulfur (S) and selenium (Se), iodine (I), and arsenic (As) or a combination thereof, and x&#x3e;0, y&#x3e;0, m&#x2265;1, n&#x2265;1; combining the precursor with a lithium ion source and with the substrate, and mixing to form a coating composition comprising a lithium oxofluorometallate having a general formula LiMOFon the substrate. Further disclosed is a core-shell electrode active material including a core capable of intercalating and deintercalating lithium coated with the lithium oxofluorometallate having the general formula LiMOF.

LimMOxFy shell formation on cathode ceramic particle for Li ion battery through onium metal oxide fluoride precursor

A process for producing a ceramic material including providing an aqueous solution comprising at least one transition metal ion and one or more further transition metal ion and/or one or more additional ion; adding to the aqueous solution a quaternary ammonium or phosphonium hydroxide comprising at least one alkyl group containing about 8 or more carbon atoms to form a combined aqueous solution; mixing the combined aqueous solution to form a gel; transferring the formed gel to a furnace; and heating the formed gel to a temperature sufficient for a time sufficient to calcine the gel to form a solid ceramic material. The process in accordance with the present invention provides an improved ceramic material, in some embodiments of which is suitable for use in the cathode material of a lithium ion battery.

Gel method for preparation of ceramic material

The present invention provides a process for depositing an oxide coating on an inorganic substrate, including providing an aqueous composition containing a tetraalkylammonium polyoxoanion and hydrogen peroxide; contacting the aqueous composition with an inorganic substrate for a time sufficient to deposit a hydroxide derived from the polyoxoanion on surfaces of the inorganic substrate to form an initially coated inorganic substrate; and heating the initially coated inorganic substrate for a time sufficient to convert the hydroxide to an oxide to form on the inorganic substrate an oxide coating derived from the polyoxoanion. The inorganic substrate may be a ceramic material or a semiconductor material, a glass or other dielectric material, and the ceramic material may be a lithium ion battery cathode material.

Oxide shell formation on inorganic substrate via oxidative polyoxoanion salt deposition

The present invention provides a process for depositing an oxide coating on an inorganic substrate, including providing an aqueous composition containing a tetraalkylammonium polyoxoanion and lithium hydroxide; contacting the aqueous composition with an inorganic substrate for a time sufficient to deposit a lithium polyoxoanion on surfaces of the inorganic substrate to form an initially coated inorganic substrate; and heating the initially coated inorganic substrate for a time sufficient to convert the lithium polyoxoanion to an oxide to form on the inorganic substrate an oxide coating derived from the polyoxoanion. The inorganic substrate may be a ceramic material or a semiconductor material, a glass or other dielectric material, and the ceramic material may be a lithium ion battery cathode material.

Oxide shell formation on inorganic substrates via lithium polyoxoanion salt deposition

A composition for removing particulate matter from integrated circuit substrates, including (a) one or more metal ion-free base; (b) a water-soluble metal ion-free onium salt of a polyhedral silsesquioxane; (c) an oxidizing agent; and (d) metal ion-free water, and a composition obtained by combining ingredients including (a), (b), (c) and (d). A process for removing particulate matter from a surface of an integrated circuit device, including applying to the surface the composition including (a), (b), (c) and (d) or applying to the surface the composition obtained by combining ingredients including (a), (b), (c) and (d).

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Austin, TX, United States of America

Jianjun Hao