Other

Boe Technology Group Co., Ltd.

Ordos Yuansheng Optoelectronics Co., Ltd.

Jianjun Chen

Junhua Li

Yue Peng

Wei Liu

Dong Wang

Jing Li

Xinbo Zhou

Xiaoguang Chen

Jianbin Gao

Zhimin Wang

Yongbo Ju

Lina Gan

Xiansheng Li

Xikang Jin

Shuangjiang Yu

The present disclosure provides a thin-film transistor and a method for manufacturing the same, an array substrate, and a display device. The thin film transistor of the present disclosure include a plurality of insulating layers, among which at least one insulating layer on the low temperature polysilicon layer comprises organic material, so vias could be formed in the organic material by an exposing and developing process, thereby effectively avoiding the over-etching problem of the low temperature polycrystalline silicon layer caused by dry etching process. By adopting the method for manufacturing the film transistors of the present disclosure, the contact area and uniformity of the drain electrode and the low temperature polysilicon material layer can be increased; the conductivity can be improved; and the production cycle of products can be greatly reduced and thereby improving the equipment capacity.

Thin-film transistor and method for manufacturing the same, array substrates, display devices

The invention belongs to the field of nitrogen oxide control in environmental protection science and technology, and particularly relates to the field of regeneration and utilization of SCR denitration catalyst with calcium poisoning, that is a neutral complex cleaning liquid and a regeneration method for denitration catalyst with calcium poisoning. The present invention uses a neutral polyether surfactant as a regeneration and calcium removal reagent to achieve a poisoned catalyst regeneration method with high calcium removal rate, low loss rate of active components and excellent recovery of denitrification activity; wherein the content of the polyether surfactant is in the range of 0.1-1 wt %; by the regeneration method of the present invention, the loading of active components which is required in the conventional regeneration process can be omitted, while the corrosion of equipment and catalyst can be reduced, thus capable of regenerating the denitration catalyst with high efficiency.

Neutral complex cleaning solution and regeneration method for denitration catalyst with calcium poisoning

The invention discloses a preparation method and application of a denitration catalyst with wide operating temperature for flue gas, which utilizes an organic vanadium compound as a vanadium precursor, and titanium dioxide powder or titanium tungsten powder as a carrier, and is prepared by mechanical ball milling method and heat treatment to obtain a catalyst, which denitration of fixed source flue gas under wide temperature range. Compared with the existing arts, the present invention includes minor modifications to the traditional vanadium tungsten titanium catalyst system and adopts the mechanical ball milling method, the activity and resistance to sulfur and water poisoning are improved significantly, thus providing a preparation technology of SCR denitration powder catalyst which is green, highly efficient, low cost and simple in operation. Through the interaction of the organic vanadium precursor with the carrier, the vanadium surface atom concentration of the catalyst is higher, the species of polymeric vanadium is more, and the vanadium oxide is more easily reduced, thereby obtaining higher denitrification activity at low temperature. The denitration catalyst of the present invention has relatively higher activity at 200-450&#xb0; C. while having good resistance to sulfur and water poisoning.

Preparation method of denitration catalyst with wide operating temperature range for flue gas

Growing community of inventors

Beijing, China

Jianjun Chen