Az Electronic Materials USA Corp.

Clariant Finance (bvi) Limited

Alliedsignal Inc.

Az Electronic Materials (luxembourg) S.a.r.l.

Corning Incorporated

Merck Patent Gmbh

Jianhui Shan

Hengpeng Wu

Chengjiu Wu

Dinesh N Khanna

Guanyang Lin

Jian Yin

Shuji Ding

JiHoon Kim

Dana L Durham

Huirong Yao

Salem K Mullen

Shuji Sue Ding-Lee

Zhong Xiang

Ralph R Dammel

M Dalil Rahman

James T Yardley

Ping-Hung Lu

JoonYeon Cho

Mark O Neisser

Joseph E Oberlander

Ajay Nahata

Baopei Xu

Hong Zhuang

Durairaj Baskaran

Eleazar B Gonzalez

Zhong Xhiang

Douglas S McKenzie

Mark A Spak

PingHung Lu

Clement Anyadiegwu

Aritaka Hishida

Iain McCulloch

Md S Rahman

Eleazor B Gonzalez

Eleazer Gonzalez

Dalil M Rahman

Jihoon Kim

Yihoon Kim

Aritaka Az Electronic Materials KK Hishida

Douglas Mckenzie

The present invention relates to a novel styrenic polymer and to the novel composition comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity from 1 to 1.3 and further wherein each polymer chain of the styrenic polymer is capped with one end group of structure 1), wherein, and L is a linking group selected from the group consisting of a direct valence bond, oxy (&#x2014;O&#x2014;), carbonyloxy, (&#x2014;(C&#x2550;O)&#x2014;O&#x2014;), carbonate (&#x2014;O&#x2014;(C&#x2550;O)&#x2014;O&#x2014;); Lis a C-1 to C-20 substituted or unsubstituted alkylene spacer, an arylene spacer or a direct valence bond, R, is hydrogen, a halide, a C-1 to C-20 alkyl moiety, or a C-1 to C-20 alkyloxy moiety, m is an integer from 1 to 3; and (I) represent the direct valence bond attaching the end group 1) to the end of the polymer chain of the styrenic polymer. In another aspect of this invention it pertains to the use of this composition to create self-assembly process. 

Compositions and processes for self-assembly of block copolymers

The present invention relates to non aqueous, graftable coating composition comprised of a homogenous solution of a polymer and a spin casting organic solvent, where the composition does not contain acidic compounds, coloring particles, pigments or dyes, and the polymer has a linear polymer chain structure which is comprised of repeat units derived from monomers containing a single polymerizable olefinic carbon double bond, and the polymer contains at least one triarylmethyl chalcogenide containing moiety which is selected from the group consisting of repeat units having structure (I) an end chain group unit of structure (II) and mixtures thereof, and the polymer does not contain any repeat units or end groups containing water ionizable groups, ionic groups, free thiol groups, or free hydroxy groups, and where A, A, and Aare independently an Aryl or a substituted Aryl; Y is a chalcogen selected from O, S, Se or Te; Xand Xare individually selected organic spacers; Pis an organic polymer repeat unit moiety derived from a monomer containing a single polymerizable olefinic carbon double bound, and Pis an end group moiety derived from a monomer containing a single polymerizable olefinic carbon double bound, andrepresents a direct valence bond to the linear polymer.  The invention also relates to using this novel coating composition to form a grafted polymer film on a substrate.

Compositions and use thereof for modification of substrate surfaces

The present invention relates to novel copolymers containing cross-linkable and graft-able moieties, novel compositions comprised of these novel copolymers and a solvent, and methods for using these novel compositions to form neutral layer films which are both cross-linked and grafted on the substrate which are used in processes for aligning microdomains of block copolymers (BCP) on this neutral layer coated substrate such as self-assembly and directed self-assembly. The novel compositions are comprised of at least one novel random copolymer comprised of least one unit of structure (1), at least one unit of structure (2) at least one unit of structure (3) oneH end group and one end group having structure (1'); where Ris selected from the group consisting of a C-Calkyl, C-Cfluoroalkyl, C-Cpartially fluorinated alkyl moiety, C-Ccycloalkyl, C-Ccyclofluoroalkyl, C-Cpartially fluorinated cycloalkyl, and a C-Chydroxyalkyl; R, Rand Rare independently selected from a group consisting of H, C-Calkyl, CFand F; Ris selected from the group consisting of H, C-Calkyl, C-Cpartially fluorinated alkyl moiety and C-Cfluoroalkyl, n ranges from 1 to 5, Ris selected from the group consisting of H, F, C-Calkyl and a C-Cfluoroalkyl and m ranges from 1 to 3, and n&#x2032; ranges from 1 to 5, and n&#x2033; ranges from 1 to 5, n&#x2032;&#x2033; ranges from 1 to 5, Ris a Cto Calkyl and X is &#x2014;CN, or an alkyloxycarbonyl moiety R&#x2014;O&#x2014;(C&#x2550;O)&#x2014; where Ris a Cto Calkyl andrepresent the attachment point of the end group to the polymer. The novel polymers, compositions and processes are useful for fabrication of electronic devices.

Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I): wherein R is chosen from H, C-Calkyl, or halogen, and W is a divalent group chosen from C-Calkylene, C-Carylene, benzylene, or C-Calkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer.

Underlayer composition for promoting self assembly and method of making and using

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):-A-B-C-&#x2003;&#x2003;(1)where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where Ris C-Calkyl and Ris C-Calkyl. The invention further relates to a process for forming an image using the composition.

Antireflective coating composition and process thereof

A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein Uand Uare independently a C-Calkylene group; V is selected from a C-Calkylene, arylene and aromatic alkylene; W is selected from H, C-Calkyl, aryl, alkylaryl and V&#x2014;OH; Y is selected from H, W, and UC(O)OW, wherein Uis independently a C-Calkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.

Antireflective compositions and methods of using same

Antireflective coating compositions and related polymers are disclosed.

Antireflective coating compositions

The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.

Antireflective compositions for photoresists

The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, The invention further relates to a process for imaging the antireflective coating composition.

Antireflective composition for photoresists

The present invention relates to a process for making a polyester where a dianhydride is reacted with a diol. The resulting polyester can be further reacted with a compound selected from aromatic oxides, aliphatic oxides, alkylene carbonates, alcohols, and mixtures thereof.

Process for making polyesters

Modified alginic acid or alginic acid derivatives and anti-reflective coatings based on thereon are described.

Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof

This invention relates to a novel class of halofluorinated acrylates and more particularly to chlorofluorinated or bromofluorinated acrylates characterized by a chlorofluorinated or bromofluorinated alkylene moiety with acrylate functions at both terminals. These chlorofluorinated acrylates may be photocured in the presence of a photoinitiator into transparent polymers useful as optical waveguiding materials.

Photocurable halofluorinated acrylates

Method for making unsymmetrically substituted fluorenyl compounds for nonlinear optical applications

A method of coupling a diazonium salt with an organic polymer comprising, on order, the steps of: providing a polymer in one liquid phase; providing an diazonium salt in a separate liquid phase; contacting the separate phases, and thereby reacting the polymer and the diazonium salt.

Method for synthesizing polymeric AZO dyes

Growing community of inventors

Pennington, NJ, United States of America

Jianhui Shan